Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes von Volynets, Vladimir, Barsukov, Yuri, Kim, Gonjun, Jung, Ji-Eun, Nam, Sang Ki, Han, Kyuhee, Huang, Shuo, Kushner, Mark J.

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Highly selective Si3N4/SiO2 etching using an NF3/N-2/O-2/H-2 remote plasma. I. Plasma source and critical fluxes von Volynets, Vladimir, Barsukov, Yuri, Kim, Gonjun, Jung, Ji-Eun, Nam, Sang Ki, Han, Kyuhee, Huang, Shuo, Kushner, Mark J.

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Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism von Jung, Ji-Eun, Barsukov, Yuri, Volynets, Vladimir, Kim, Gonjun, Nam, Sang Ki, Han, Kyuhee, Huang, Shuo, Kushner, Mark J.

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Role of NO in highly selective SiN/SiO2 and SiN/Si etching with NF3/O2 remote plasma: Experiment and simulation von Barsukov, Yuri, Volynets, Vladimir, Lee, Sangjun, Kim, Gonjun, Lee, Byoungsu, Nam, Sang Ki, Han, Kyuhee

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Highly selective Si 3 N 4 /SiO 2 etching using an NF 3 /N 2 /O 2 /H 2 remote plasma. I. Plasma source and critical fluxes von Volynets, Vladimir, Barsukov, Yuri, Kim, Gonjun, Jung, Ji-Eun, Nam, Sang Ki, Han, Kyuhee, Huang, Shuo, Kushner, Mark J.

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Highly selective Si 3 N 4 /SiO 2 etching using an NF 3 /N 2 /O 2 /H 2 remote plasma. II. Surface reaction mechanism von Jung, Ji-Eun, Barsukov, Yuri, Volynets, Vladimir, Kim, Gonjun, Nam, Sang Ki, Han, Kyuhee, Huang, Shuo, Kushner, Mark J.

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Targeted Cancer Treatment Using Anti-EGFR and -TFR Antibody-Conjugated Gold Nanoparticles Stimulated by Nonthermal Air Plasma von Kim, GonJun, Park, S. R., Kim, G. C., Lee, Jae Koo (J.K.)

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Targeted Cancer Treatment Using Anti-EGFR and -TFR Antibody-Conjugated Gold Nanoparticles Stimulated by Nonthermal Air Plasma von Kim, GonJun, Park, S. R., Kim, G. C., Lee, Jae Koo (J. K.)

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SUBSTRATE PROCESSING APPARATUS INCLUDING SHOWER HEAD AND EDGE RING AND RELATED METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES von KIM, Younghoo, KANG, Sunggil, KIM, Inseong, LEE, Woorim, KIM, Gonjun

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