Determination of Motivating Factors of Urban Forest Visitors through Latent Dirichlet Allocation Topic Modeling von Kim, Doo-San, Lee, Byeong-Cheol, Park, Kwang-Hi

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Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasma von Lee, Won Oh, Kim, Ki Hyun, Kim, Doo San, Ji, You Jin, Kang, Ji Eun, Tak, Hyun Woo, Park, Jin Woo, Song, Han Dock, Kim, Ki Seok, Cho, Byeong Ok, Kim, Young Lae, Yeom, Geun Young

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Anisotropic atomic layer etching of W using fluorine radicals/oxygen ion beam von Kim, Doo San, Kim, Ju Eun, Lee, Won Oh, Park, Jin Woo, Gill, You Jung, Jeong, Byeong Hwa, Yeom, Geun Young

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Plasma Induced Damage Reduction of Ultra Low-k Dielectric by Using Source Pulsed Plasma Etching for Next BEOL Interconnect Manufacturing von Jang, Jun Ki, Tak, Hyun Woo, Shin, Ye Ji, Kim, Doo San, Yeom, Geun Young

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Effect of different pulse modes during Cl2/Ar inductively coupled plasma etching on the characteristics of nanoscale silicon trench formation von Kim, Hee Ju, Wen, Long, Kim, Doo San, Kim, Ki Hyun, Hong, Jong Woo, Chang, Won Jun, Namgoong, Soo, Kim, Dong Woo, Yeom, Geun Young

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Plasma atomic layer etching of ruthenium by oxygen adsorption-removal cyclic process von Kim, Doo San, Kwon, Hae In, Jang, Yun Jong, Kim, Gyoung Chan, Gil, Hong Seong, Kim, Dae Whan, Jeong, Byeong Hwa, Yeom, Geun Young

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Cyclic Atomic Layer Etching of PdSe2 von Kang, Ji Eun, Choi, Seung Yup, Han, Hye Won, Kim, Ji Min, Kim, Ye Eun, Seok, Hyunho, Kim, Taesung, Kim, Doo San, Yeom, Geun Young

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Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methanol vapor von Gil, Hong Seong, Kim, Doo San, Jang, Yun Jong, Kim, Dea Whan, Kwon, Hea In, Kim, Gyoung Chan, Kim, Dong Woo, Yeom, Geun Young

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Radical flux control in reactive ion beam etching (RIBE) by dual exhaust system von Kim, Doo San, Jang, Yun Jong, Kim, Ye Eun, Gil, Hong Seong, Kim, Hee Ju, Ji, You Jin, Kim, Hyung Yong, Kim, In Ho, Chae, Myoung Kwan, Park, Jong Chul, Yeom, Geun Young

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Bond performance of reinforced concrete beams with electric arc furnace slag aggregates von Lee, Yong-Jun, Kim, Hyeong-Gook, Kim, Min-Jun, Kim, Dong-Hwan, Kim, Doo-San, Kim, Kil-Hee

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Atomic layer etching of chrome using ion beams von Park, Jin Woo, Kim, Doo San, Lee, Won Oh, Kim, Ju Eun, Yeom, Geun Young

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Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow von Gill, You Jung, Kim, Doo San, Gil, Hong Seong, Kim, Ki Hyun, Jang, Yun Jong, Kim, Ye Eun, Yeom, Geun Young

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Reactive ion etching of an ovonic threshold switch (OTS) material using hydrogen-based plasmas for non-volatile phase change memories von Kim, Doo San, Kim, Ju Eun, Gill, You Jung, Park, Jin Woo, Jang, Yun Jong, Kim, Ye Eun, Choi, Hyejin, Kwon, Oik, Yeom, Geun Young

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Low temperature silicon nitride grown by very high frequency (VHF, 162MHz) plasma enhanced atomic layer deposition with floating multi-tile electrode von Ji, You Jin, Kim, Hae In, Kim, Ki Hyun, Kang, Ji Eun, Kim, Doo San, Kim, Ki Seok, Ellingboe, A.R., Kim, Dong Woo, Yeom, Geun Young

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The studies on characteristics of return to estrus in postpartum dairy cattle von Kim, Doo-San, Lee, Ji-Hwan, Jang, Gul-Won, Choi, Eun-Jeong, Kim, Jin-Ju, Lee, Ji-An, Son, Jun-Kyu

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Effects of Discontinuous Percoll Gradient Containing Alpha-linolenic Acid on Characteristics of Frozen-thawed Boar Spermatozoa von Kim, Doo-San, Hwangbo, Yong, Cheong, Hee-Tae, Park, Choon-Keun

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Cyclic Atomic Layer Etching of PdSe 2 von Kang, Ji Eun, Choi, Seung Yup, Han, Hye Won, Kim, Ji Min, Kim, Ye Eun, Seok, Hyunho, Kim, Taesung, Kim, Doo San, Yeom, Geun Young

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Atomic layer etching of Sn by surface modification with H and Cl radicals von Kim, Doo San, Jang, Yun Jong, Kim, Ye Eun, Gil, Hong Seong, Jeong, Byeong Hwa, Yeom, Geun Young

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Plasma enhanced atomic layer deposition of silicon nitride using magnetized very high frequency plasma von Ji, You Jin, Kim, Hae In, Kang, Ji Eun, Choi, Seung Yup, Kim, Ki Hyun, Kim, Doo San, Ellingboe, A R, Kim, Hye Min, Yeom, Geun Young, Kim, Dong Woo

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In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential von Park, Jin Woo, Chae, Myeong Gyoon, Kim, Doo San, Lee, Won Oh, Song, Han Dock, Choi, Changhwan, Yeom, Geun Young

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