A MOSFET Fabrication Using a Maskless Lithography System in Clean-Localized Environment of Minimal Fab von Khumpuang, Sommawan, Hara, Shiro

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Via Interconnections for Half-Inch Packaging of Electronic Devices Using Minimal Fab Process Tools von Imura, Fumito, Inoue, Michihiro, Khumpuang, Sommawan, Hara, Shiro

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Fabrication of nano-capillary emitter arrays for ionic liquid electrospray thrusters von Suzuki, Kanta, Nagao, Masayoshi, Liu, Yongxun, Murakami, Katsuhisa, Khumpuang, Sommawan, Hara, Shiro, Takao, Yoshinori

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Fabrication of a high-density emitter array for electrospray thrusters using field emitter array process von Inoue, Naoki, Nagao, Masayoshi, Murakami, Katsuhisa, Khumpuang, Sommawan, Hara, Shiro, Takao, Yoshinori

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Small Plasma Space with a Small Plasma Source and Its Advantage in Minimal Fab von Tanaka, Hiroyuki, Khumpuang, Sommawan, Hara, Shiro

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An experimental study of solid source diffusion by spin on dopants and its application for minimal silicon-on-insulator CMOS fabrication von Liu, Yongxun, Koga, Kazuhiro, Khumpuang, Sommawan, Nagao, Masayoshi, Matsukawa, Takashi, Hara, Shiro

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Investigation of piezoresistive effect in p-channel metal-oxide-semiconductor field-effect transistors fabricated on circular silicon-on-insulator diaphragms using cost-effective m... von Liu, Yongxun, Tanaka, Hiroyuki, Umeyama, Norio, Koga, Kazuhiro, Khumpuang, Sommawan, Nagao, Masayoshi, Matsukawa, Takashi, Hara, Shiro

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Bring Notable Beauties into Life Science von KHUMPUANG, Sommawan

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Plain-pattern to cross-section transfer (PCT) technique for deep x-ray lithography and applications von Sugiyama, Susumu, Khumpuang, Sommawan, Kawaguchi, Gaku

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Characterization of Contact Structure for Woven Electronic Textile Using Conductive Polymer Micro-Cantilever Array von Yamashita, Takahiro, Khumpuang, Sommawan, Miyake, Koji, Itoh, Toshihiro

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Analyses on Cleanroom-Free Performance and Transistor Manufacturing Cycle Time of Minimal Fab von Khumpuang, Sommawan, Imura, Fumito, Hara, Shiro

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Microneedle fabrication using the plane pattern to cross-section transfer method von Khumpuang, Sommawan, Horade, Mitsuhiro, Fujioka, Kazuya, Sugiyama, Susumu

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A method to deposit a known number of polystyrene latex particles on a flat surface von Tajima, Naoko, Iida, Kenjiro, Ehara, Kensei, Khumpuang, Sommawan, Hara, Shiro, Sakurai, Hiromu

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Microfabrication of surface acoustic wave devices with AlN thin film deposited on half‐inch quartz wafer von Nagano, Asahi, Kitamura, Kanato, Noda, Shuichi, Murakami, Sunao, Iguchi, Kohei, Khumpuang, Sommawan, Hara, Shiro

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Is the Si-O Stretching Mode from Gate Oxide in MOS Structure related to the Density of Interface States? von Lozach, Mickael, Khumpuang, Sommawan, Hara, Shiro

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Consideration of relationship between the variation of Gate Oxide Thicknesses and the density of interface states for MOS structure von Lozach, Mickael, Khumpuang, Sommawan, Hara, Shiro

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(Invited) Development of CMOS-MEMS Cointegrated Pressure Sensor Using Minimal Fab Process von Liu, Yongxun, Akita, Ippei, Matsukawa, Takashi, Tanaka, Hiroyuki, Koga, Kazuhiro, Nemoto, Kazumasa, Khumpuang, Sommawan, Nagao, Masayoshi, Morita, Yukinori, Hara, Shiro

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ミニマルファブのための小型HiPIMS型スパッタ成膜装置の開発 von 小木曽, 久人, 行村, 建, 中野, 禅, 田中, 宏幸, クンプアン, ソマワン, 薮田, 勇気, 亀井, 龍一郎, 原, 史朗

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Design and Fabrication of 1D and 2D Micro Scanners Actuated by Double Layered Lead Zirconate Titanate (PZT) Bimorph Beams von Tsaur, Jiunnjye, Zhang, Lulu, Maeda, Ryutaro, Matsumoto, Sohei, Khumpuang, Sommawan

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Solution-Driven Collaboration between Government, Industry and Academia Realizing Minimal Fab von HARA, Shiro, KHUMPUANG, Sommawan, MAEKAWA, Hitoshi, IKEDA, Shinichi, ISHIDA, Yuuki, KURUMIDA, Junya, INOUE, Michihiro, KUBOUCHI, Koichi

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