HfO2 gate dielectric on Ge (111) with ultrathin nitride interfacial layer formed by rapid thermal NH3 treatment von Agrawal, Khushabu S., Patil, Vilas S., Khairnar, Anil G., Mahajan, Ashok M.

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Structural and electrical characteristics of RF-sputtered HfO2 high-k based MOS capacitors von TIRMALI, P. M, KHAIRNAR, Anil G, JOSHI, Bhavana N, MAHAJAN, A. M

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Sol–gel deposited ceria thin films as gate dielectric for CMOS technology von KHAIRNAR, ANIL G, MAHAJAN, ASHOK M

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Preparation of rare earth CeO2 thin films using metal organic decomposition method for metal-oxide–semiconductor capacitors von Agrawal, Khushabu S., Patil, Vilas S., Khairnar, Anil G., Mahajan, Ashok M.

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High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates von Mahajan, A. M., Khairnar, Anil G., Thibeault, B. J.

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Enhancement in mechanical properties of silica low-k thin films using wet chemical technique von Mhaisagar, Yogesh S, Gaikwad, Anil S, Khairnar, Anil G, Mahajan, Ashok M

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Investigation of Current Conduction Mechanism in HfO2 Thin Film on Silicon Substrate von Khairnar, Anil G., Agrawal, Khushaboo S., Patil, Vilas S., Mahajan, Ashok M.

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Structural and electrical characteristics of RF-sputtered HfO 2 high-k based MOS capacitors von Tirmali, P.M., Khairnar, Anil G., Joshi, Bhavana N., Mahajan, A.M.

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Structural and electrical characteristics of RF-sputtered HfO sub(2) high-k based MOS capacitors von Tirmali, P M, Khairnar, Anil G, Joshi, Bhavana N, Mahajan, A M

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Capacitance-Voltage Measurement of SiO2/GeOxNy Gate Stack on Surface Passivated Germanium von Khairnar, Anil G., Patil, Vilas S., Mahajan, Ashok M.

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Synthesis and characterization of 2-D La-doped Bi2O3 for photocatalytic degradation of organic dye and pesticide von Khairnar, Subhash D., Kulkarni, Anil N., Shinde, Sachin G., Marathe, Sunil D., Marathe, Yogesh V., Dhole, Sanjay D., Shrivastava, Vinod S.

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