Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates von Di Giacomo, Francesco, Zardetto, Valerio, D'Epifanio, Alessandra, Pescetelli, Sara, Matteocci, Fabio, Razza, Stefano, Di Carlo, Aldo, Licoccia, Silvia, Kessels, Wilhelmus M. M., Creatore, Mariadriana, Brown, Thomas M.

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From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity von Mackus, Adriaan J. M, Merkx, Marc J. M, Kessels, Wilhelmus M. M

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Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies von Faraz, Tahsin, Knoops, Harm C. M, Verheijen, Marcel A, van Helvoirt, Cristian A. A, Karwal, Saurabh, Sharma, Akhil, Beladiya, Vivek, Szeghalmi, Adriana, Hausmann, Dennis M, Henri, Jon, Creatore, Mariadriana, Kessels, Wilhelmus M. M

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Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 von Arts, Karsten, Thepass, Harvey, Verheijen, Marcel A, Puurunen, Riikka L, Kessels, Wilhelmus M. M, Knoops, Harm C. M

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Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution von Balasubramanyam, Shashank, Shirazi, Mahdi, Bloodgood, Matthew A, Wu, Longfei, Verheijen, Marcel A, Vandalon, Vincent, Kessels, Wilhelmus M. M, Hofmann, Jan P, Bol, Ageeth A

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Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells von Koushik, Dibyashree, Jošt, Marko, Du inskas, Algirdas, Burgess, Claire, Zardetto, Valerio, Weijtens, Christ, Verheijen, Marcel A, Kessels, Wilhelmus M. M, Albrecht, Steve, Creatore, Mariadriana

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Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation von Singh, Joseph A, Thissen, Nick F. W, Kim, Woo-Hee, Johnson, Hannah, Kessels, Wilhelmus M. M, Bol, Ageeth A, Bent, Stacey F, Mackus, Adriaan J. M

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Electron Scattering and Doping Mechanisms in Solid-Phase-Crystallized In2O3:H Prepared by Atomic Layer Deposition von Macco, Bart, Knoops, Harm C. M, Kessels, Wilhelmus M. M

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Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers von Andringa, Anne-Marije, Perrotta, Alberto, de Peuter, Koen, Knoops, Harm C. M, Kessels, Wilhelmus M. M, Creatore, Mariadriana

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Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors von Merkx, Marc J. M, Angelidis, Athanasios, Mameli, Alfredo, Li, Jun, Lemaire, Paul C, Sharma, Kashish, Hausmann, Dennis M, Kessels, Wilhelmus M. M, Sandoval, Tania E, Mackus, Adriaan J. M

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Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography von Wu, Yizhi, Giddings, A. Devin, Verheijen, Marcel A, Macco, Bart, Prosa, Ty J, Larson, David J, Roozeboom, Fred, Kessels, Wilhelmus M. M

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Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition von Basuvalingam, Saravana Balaji, Zhang, Yue, Bloodgood, Matthew A, Godiksen, Rasmus H, Curto, Alberto G, Hofmann, Jan P, Verheijen, Marcel A, Kessels, Wilhelmus M. M, Bol, Ageeth A

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Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2 von Arts, Karsten, Deijkers, Sanne, Puurunen, Riikka L, Kessels, Wilhelmus M. M, Knoops, Harm C. M

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Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride von Ande, Chaitanya Krishna, Knoops, Harm C. M, de Peuter, Koen, van Drunen, Maarten, Elliott, Simon D, Kessels, Wilhelmus M. M

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Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity von Merkx, Marc J. M, Vlaanderen, Sander, Faraz, Tahsin, Verheijen, Marcel A, Kessels, Wilhelmus M. M, Mackus, Adriaan J. M

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Surface passivation of germanium by atomic layer deposited Al2O3 nanolayers von Berghuis, Wilhelmus J. H., Melskens, Jimmy, Macco, Bart, Theeuwes, Roel J., Verheijen, Marcel A., Kessels, Wilhelmus M. M.

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Area-Selective Atomic Layer Deposition of In2O3:H Using a μ‑Plasma Printer for Local Area Activation von Mameli, Alfredo, Kuang, Yinghuan, Aghaee, Morteza, Ande, Chaitanya K, Karasulu, Bora, Creatore, Mariadriana, Mackus, Adriaan J. M, Kessels, Wilhelmus M. M, Roozeboom, Fred

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Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization von Vervuurt, René H. J, Karasulu, Bora, Verheijen, Marcel A, Kessels, Wilhelmus (Erwin) M. M, Bol, Ageeth A

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Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2 von Arts, Karsten, Utriainen, Mikko, Puurunen, Riikka L, Kessels, Wilhelmus M. M, Knoops, Harm C. M

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Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers von Balasubramanyam, Shashank, Merkx, Marc J. M, Verheijen, Marcel A, Kessels, Wilhelmus M. M, Mackus, Adriaan J. M, Bol, Ageeth A

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