The use of atomic layer deposition in advanced nanopatterning von Mackus, A. J. M, Bol, A. A, Kessels, W. M. M

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What is limiting low-temperature atomic layer deposition of Al2O3? A vibrational sum-frequency generation study von Vandalon, V., Kessels, W. M. M.

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Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications von Sharma, Akhil, Mahlouji, Reyhaneh, Wu, Longfei, Verheijen, Marcel A, Vandalon, Vincent, Balasubramanyam, Shashank, Hofmann, Jan P, (Erwin) Kessels, W M M, Bol, Ageeth A

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Passivating Contacts for Crystalline Silicon Solar Cells: From Concepts and Materials to Prospects von Melskens, Jimmy, van de Loo, Bas W. H., Macco, Bart, Black, Lachlan E., Smit, Sjoerd, Kessels, W. M. M.

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Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology von Sharma, Akhil, Verheijen, Marcel A, Wu, Longfei, Karwal, Saurabh, Vandalon, Vincent, Knoops, Harm C M, Sundaram, Ravi S, Hofmann, Jan P, W M M (Erwin) Kessels, Bol, Ageeth A

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Ultralow Surface Recombination Velocity in Passivated InGaAs/InP Nanopillars von Higuera-Rodriguez, A, Romeira, B, Birindelli, S, Black, L. E, Smalbrugge, E, van Veldhoven, P. J, Kessels, W. M. M, Smit, M. K, Fiore, A

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The developmental stages of synaptic plasticity von Lohmann, Christian, Kessels, Helmut W.

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Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing von van Delft, J A, Garcia-Alonso, D, Kessels, W M M

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Advanced process technologies: Plasma, direct-write, atmospheric pressure, and roll-to-roll ALD von (Erwin) Kessels, W.M.M., Putkonen, Matti

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Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency Generation von Vandalon, V, Mackus, A.J.M, Kessels, W.M.M

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Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3 von Schmidt, J., Merkle, A., Brendel, R., Hoex, B., de Sanden, M. C. M. van, Kessels, W. M. M.

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Metabotropic NMDA receptor function is required for β-amyloid–induced synaptic depression von Kessels, Helmut W., Nabavi, Sadegh, Malinow, Roberto

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Atomic layer deposition of conductive and semiconductive oxides von Macco, Bart, Kessels, W. M. M. (Erwin)

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Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges von Profijt, H. B., Potts, S. E., van de Sanden, M. C. M., Kessels, W. M. M.

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Initial Growth Study of Atomic-Layer Deposition of Al2O3 by Vibrational Sum-Frequency Generation von Vandalon, V, Kessels, W. M. M. Erwin

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Silicon surface passivation by transparent conductive zinc oxide von van de Loo, B. W. H., Macco, B., Melskens, J., Beyer, W., Kessels, W. M. M.

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Energy-enhanced atomic layer deposition for more process and precursor versatility von Potts, S.E., Kessels, W.M.M.

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Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study von Beladiya, Vivek, Becker, Martin, Faraz, Tahsin, Kessels, W. M. M. (Erwin), Schenk, Paul, Otto, Felix, Fritz, Torsten, Gruenewald, Marco, Helbing, Christian, Jandt, Klaus D, Tünnermann, Andreas, Sierka, Marek, Szeghalmi, Adriana

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Metabotropic NMDA receptor function is required for NMDA receptor-dependent long-term depression von Nabavi, Sadegh, Kessels, Helmut W., Alfonso, Stephanie, Aow, Jonathan, Fox, Rocky, Malinow, Roberto

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In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition von Langereis, E, Heil, S B S, Knoops, H C M, Keuning, W, van de Sanden, M C M, Kessels, W M M

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