Modeling of low pressure plasma sources for microelectronics fabrication von Agarwal, Ankur, Bera, Kallol, Kenney, Jason, Likhanskii, Alexandre, Rauf, Shahid

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Three-dimensional model of magnetized capacitively coupled plasmas von Rauf, Shahid, Kenney, Jason, Collins, Ken

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Electrochemical machining with ultrashort voltage pulses: modelling of charging dynamics and feature profile evolution von Kenney, Jason A, Hwang, Gyeong S

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Ar/CF4 capacitively coupled plasma generated using 40 MHz sinusoidal and 800 kHz rectangular waveform voltages von Rauf, Shahid, Ganta, Sathya, Shi, Xingyi, Bera, Kallol, Kenney, Jason

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Ar/CF 4 capacitively coupled plasma generated using 40 MHz sinusoidal and 800 kHz rectangular waveform voltages von Rauf, Shahid, Ganta, Sathya, Shi, Xingyi, Bera, Kallol, Kenney, Jason

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Numerical and experimental study of ion energy distribution function in a dual-frequency capacitively coupled oxygen discharge von Luo, Han, Kenney, Jason, Rauf, Shahid, Korolov, Ihor, Schulze, Julian

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Effects of macroparticle weighting in axisymmetric particle-in-cell Monte Carlo collision simulations von Hara, Kentaro, Robertson, Timothy, Kenney, Jason, Rauf, Shahid

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Capacitively Coupled Plasma With an Asymmetric Dielectric Plate von Kenney, J. A., Rauf, S., Collins, K.

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Plasma dynamics in a capacitively coupled discharge driven by a combination of a single high frequency and a tailored low frequency rectangular voltage waveform von Rauf, Shahid, Schroeder, Manuel, Korolov, Ihor, Kenney, Jason, Schulze, Julian

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Effect of low frequency voltage waveform on plasma uniformity in a dual-frequency capacitively coupled plasma von Rauf, Shahid, Tian, Peng, Kenney, Jason, Dorf, Leonid

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Uniformity of low-pressure capacitively coupled plasmas: Experiments and two-dimensional particle-in-cell simulations von Tian, Peng, Kenney, Jason, Rauf, Shahid, Korolov, Ihor, Schulze, Julian

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Ion energy distribution functions in a dual-frequency low-pressure capacitively-coupled plasma: experiments and particle-in-cell simulation von Wang, Jun-Chieh, Tian, Peng, Kenney, Jason, Rauf, Shahid, Korolov, Ihor, Schulze, Julian

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On the use of pulsed DC bias for etching high aspect ratio features von Shi, Xingyi, Sadighi, Samaneh, Rauf, Shahid, Luo, Han, Wang, Jun-Chieh, Kenney, Jason, Booth, Jean-Paul, Marinov, Daniil, Foucher, Mickaël, Sirse, Nishant

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Validation of MYC and BCL6 rapid break apart digital fluorescence in situ hybridization assays for clinical use von Liew, Michael, Rowe, Leslie, Moore, Kristina, Aston, Emily, O'Brien, Kathryn, Longhurst, Maria, Kenney, Jason, Priest, Marshall, Zhou, Wenhua, Wilcock, Diane, Rets, Anton, Miles, Rodney

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Influence of inhomogeneous magnetic field on the characteristics of very high frequency capacitively coupled plasmas von Bera, Kallol, Rauf, Shahid, Kenney, Jason, Dorf, Leonid, Collins, Ken

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Clinicopathologic and molecular features of six cases of phosphaturic mesenchymal tumor von Sun, Lulu, Dehner, Carina, Kenney, Jason, McNulty, Samantha M., Zhu, Xiaopei, Pfeifer, John D., Maluf, Horacio M., Chrisinger, John S. A.

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Fully Self-Consistent 3-D Modeling of Inductively Coupled Plasmas von Agarwal, Ankur, Kenney, Jason A., Rauf, Shahid, Collins, Ken

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Energy distribution of electron flux at electrodes in a low pressure capacitively coupled plasma von Rauf, Shahid, Dorf, Leonid, Kenney, Jason, Collins, Ken

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Effect of azimuthally asymmetric reactor components on a parallel plate capacitively coupled plasma von Kenney, Jason A., Rauf, Shahid, Collins, Ken

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Banding of objects with tape von Kenney, Jason

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