Electrical Via Chain Yield for DSA Contact Hole Shrink Process von Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa

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Sub-30nm via interconnects fabricated using directed self-assembly von Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa

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Application of Directed Self-Assembly Lithography to Semiconductor Device Manufacturing Process von SEINO, YURIKO, KATO, HIROKAZU, YONEMITSU, HIROKI, SATO, HIRONOBU, KANNO, MASAHIRO, KOBAYASHI, KATSUTOSHI, KAWANISHI, AYAKO, AZUMA, TSUKASA

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The Photopolymer Science and Technology Award von Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa

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Ground State Proton Transfer in Phenol–(NH3) n (n ≤ 11) Clusters Studied by Mid-IR Spectroscopy in 3–10 μm Range von Miyazaki, Mitsuhiko, Kawanishi, Ayako, Nielsen, Iben, Alata, Ivan, Ishiuchi, Shun-ichi, Dedonder, Claude, Jouvet, Christophe, Fujii, Masaaki

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Purification of a Serine Protease of Vibrio parahaemolyticus and Its Characterization von Ishihara, Masami, Kawanishi, Ayako, Watanabe, Hirofumi, Tomochika, Ken-ichi, Miyoshi, Shin-ichi, Shinoda, Sumio

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Sub-30 nm via interconnects fabricated using directed self-assembly von Kato, H, Seino, Y, Yonemitsu, H, Sato, H, Kanno, M, Kobayashi, K, Kawanishi, A, Imamura, T, Omura, M, Nakamura, N, Azuma, T

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Ground State Proton Transfer in Phenol-(NH sub(3)) sub(n) (n less than or equal to 11) Clusters Studied by Mid-IR Spectroscopy in 3-10 mu m Range von Miyazaki, Mitsuhiko, Kawanishi, Ayako, Nielsen, Iben, Alata, Ivan, Ishiuchi, Shun-ichi, Dedonder, Claude, Jouvet, Christophe, Fujii, Masaaki

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MEMORY DEVICE von ARAI, Shinya, KAWANISHI, Ayako

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SEMICONDUCTOR MEMORY DEVICE von MORI, Takeo, KAWANISHI, Ayako, SHIGA, Kanako

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SEMICONDUCTOR DEVICE von KIYOMURA, Yuya, WATARAI, Ayumi, TAGUCHI, Yuta, KUME, Ippei, KAWANISHI, Ayako

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Pattern forming method von KAWANISHI AYAKO

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Memory device von ARAI, SHINYA, KAWANISHI, AYAKO

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Memory device von KAWANISHI AYAKO, ARAI SHINYA

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MEMORY DEVICE von KAWANISHI AYAKO, ARAI SHINYA

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Memory device von ARAI, SHINYA, KAWANISHI, AYAKO

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Ground state proton transfer in phenol-(NH3)(n) (n ≤ 11) clusters studied by mid-IR spectroscopy in 3-10 μm range von Miyazaki, Mitsuhiko, Kawanishi, Ayako, Nielsen, Iben, Alata, Ivan, Ishiuchi, Shun-ichi, Dedonder, Claude, Jouvet, Christophe, Fujii, Masaaki

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Sub-30 nm via interconnects fabricated using directed self-assembly : Nanolithography 2012 von KATO, Hirokazu, SEINO, Yuriko, AZUMA, Tsukasa, YONEMITSU, Hiroki, SATO, Hironobu, KANNO, Masahiro, KOBAYASHI, Katsutoshi, KAWANISHI, Ayako, IMAMURA, Tsubasa, OMURA, Mitsuhiro, NAKAMURA, Naofumi

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PATTERN FORMATION METHOD von KAWANISHI AYAKO

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PATTERN FORMING METHOD von KAWANISHI AYAKO

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