The Evaluation Technologies of Materials Such as Polymers Used in a Semiconductor BEOL Process von Kawamoto, Yoshifumi

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Consortium for Advanced Semiconductor Materials and Technologies von KAWAMOTO, Yoshifumi, KIMURA, Keiichi

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Analysis of smear noise in interline-CCD image sensor with gate-free isolation structure von ONO, H, OZAKI, T, TANAKA, H, KAWAMOTO, Y

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Electron beam direct writing technology for 64-Mb DRAM LSIs von MURAI, F, NAKAYAMA, Y, SAKAMA, I, KAGA, T, NAKAGOME, Y, KAWAMOTO, Y, OKAZAKI, S

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The CASMAT Business Model for Semiconductor Materials von Kawamoto, Y.

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New evaluation method of low-k dielectric films by using a gated PN-junction diode and a field MOS transistor von Tamaki, Y., Ito, M., Hashino, M., Kawamoto, Y.

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New test structure for evaluating low-k dielectric interconnect layers by using ring-oscillators and metal comb/serpentine patterns von Tamaki, Y., Ito, M., Takimoto, Y., Hashino, M., Kawamoto, Y.

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FABRICATING SYSTEM AND FABRICATING METHOD TO INCREASE NUMBER OF PRODUCTS FINISHED WITHIN INTERVAL OF UNIT TIME AND ELIMINATE NECESSITY OF HIGH-PURITY CLEAN SPACE von MIZUISHI KENICHI, YOKOYAMA NATSUKI, MURAKAMI EIICHI, KAWAMOTO YOSHIFUMI, KAWAMURA YOSHIO, UTIDA FUMIHIKO

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FABRICATING SYSTEM AND METHOD TO INCREASE NUMBER OF PRODUCTS COMPLETED WITHIN UNIT INTERVAL OF TIME von MIZUISHI KENICHI, MURAKAMI EIICHI, YOKOYAMA NATSUKI, KAWAMOTO YOSHIFUMI, KAWAMURA YOSHIO, UTIDA FUMIHIKO

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SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURE THE SAME von SUMAMI HIDEO, KURE TOKUO, KAWAMOTO YOSHIFUMI

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PRODUCTION SYSTEM AND PRODUCTION METHOD von MIZUISHI KENICHI, YOKOYAMA NATSUKI, MURAKAMI EIICHI, KAWAMOTO YOSHIFUMI, UCHIDA FUMIHIKO, KAWAMURA YOSHIO

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A PROPOSAL OF A HIGHLY SENSITIVE INTERLINE CCD FOR HDTV von Ono, Hideyuki, Ozaki, Toshifumi, Tanaka, Haruhiko, Tokumasu, Kazuya, Kawamoto, Yoshifumi

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Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM's von SHINRIKI, H, KISU, T, KIMURA, S.-I, NISHIOKA, Y, KAWAMOTO, Y, MUKAI, K

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Dry Etching von OKUDAIRA, Sadayuki, SHIMOMOTO, Yasuharu, KAWAMOTO, Yoshifumi

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Design for Low Noise Photodiode of a new CCD Imager with a Lateral Overflow Gate Structure von Nakai, Masaaki, Sato, Akira, Kawamoto, Yoshifumi, Hikiba, Masayuki

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SEMICONDUCTOR MEMORY von KURE TOSHIO, SNAMI HITEO, KAWAMOTO YOSHIFUMI, MIYAO MASAMOBU, TAMURA MASAO

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An experimental 1.5-V 64-Mb DRAM von Nakagome, Y., Tanaka, H., Takeuchi, K., Kume, E., Watanabe, Y., Kaga, T., Kawamoto, Y., Murai, F., Izawa, R., Hisamoto, D., Kisu, T., Nishida, T., Takeda, E., Itoh, K.

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SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND PROCESS FOR MANUFACTURING THE SAME von FUKADA, SHINICHI, SAITO, MASAYOSHI, KAWAMOTO, YOSHIFUMI, FUKUDA, TAKUYA, KOBAYASHI, NOBUYOSHI, NAKAMURA, YOSHITAKA

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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE von KAWAMOTO YOSHIFUMI, TAKIMOTO YOSHIO

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METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR von YOKOYAMA, NATSUKI, HIDAKA, MINORU, MORIYAMA, SHIGEO, UCHIDA, FUMIHIKO, KAWAMOTO, YOSHIFUMI, KAWAMURA, YOSHIO, MATSUI, MIYAKO, YAMAMOTO, TATSUHARU

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