The new dry method of mask (relief) formation by direct electron-beam etching of resist von Bruk, M.A., Zhikharev, E.N., Streltsov, D.R., Kalnov, V.A., Spirin, A.V.

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Formation of micro- and nanostructures with well-rounded profile by new e-beam lithography principle von Bruk, M.A., Zhikharev, E.N., Rogozhin, A.E., Streltsov, D.R., Kalnov, V.A., Averkin, S.N., Spirin, A.V.

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Comparative Estimation of AlN and PZT Frequency Response Used as a Resonator in the Vibrating Ring Gyroscopes von Keshavarzdivkolaee, Kamran, Lukichev, V.F., Kalnov, V. A., Pevtsov, E. F.

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X-ray imaging by angular raster scanning von Valiev, K A, Velikov, L V, Dolgich, V T, Kalnov, V A, Protopopov, V V, Imamov, R M, Lebedev, O I, Lomov, A A

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The mechanism of formation and some properties of thin fluorocarbon films deposited onto silicon plates by electron-beam polymerization of hexafluoropropylene from the vapor phase von Bruk, M. A., Zhikharev, E. N., Volegova, I. A., Spirin, A. V., Kozlova, N. V., Teleshov, E. N., Kal’nov, V. A.

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A new type of nanostructure in Si/C composite electrodes for lithium-ion batteries von Bruk, M. A., Bespalov, V. A., Loginov, B. A., Loginov, V. B., Degtyarev, Nikolai A., Degtyarev, Nikita A., Zefirov, I. D., Kal’nov, V. A., Klochikhina, A. V., Kulova, T. L., Roginskaya, Yu. E., Skundin, A. V.

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Properties of thin poly(tetrafluoroethylene) films deposited on solid substrates by electron beam polymerization from vapor phase von Bruk, M. A., Zhikharev, E. N., Volegova, I. A., Spirin, A. V., Teleshov, E. N., Kal’nov, V. A.

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Operation of an electronic lithograph in the mode of a scanning electron microscope von Kal’nov, V. A., Novikov, Yu. A., Orlikovsky, A. A.

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Some peculiarities of a new method of microrelief creation by the direct electron-beam etching of resist von Bruk, M., Zhikharev, E., Streltsov, D., Kalnov, V., Spirin, A., Rogozhin, A.

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The new dry method of mask (relief) formation by direct electron-beam etching of resist von BRUK, M. A, ZHIKHAREV, E. N, STRELTSOV, D. R, KALNOV, V. A, SPIRIN, A. V

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Nanostructure of silicon-carbon composite thin films obtained using magnetron sputtering technique von Kupriyanov, L. Yu, Roginskaya, Yu. E., Kozlova, N. V., Politova, E. D., Kal’nov, V. A., Zhikharev, E. N.

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Lithium insertion into silicon films produced by magnetron sputtering von Roginskaya, Yu. E., Kulova, T. L., Skundin, A. M., Bruk, M. A., Zhikharev, E. N., Kal’nov, V. A.

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New type of the nanostructured composite Si/C electrodes von Roginskaya, Yu. E., Kulova, T. L., Skundin, A. M., Bruk, M. A., Zhikharev, E. N., Kal’nov, V. A., Loginov, V. B.

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The structure and properties of a new type of nanostructured composite Si/C electrodes for lithium ion accumulators von Roginskaya, Yu. E., Kulova, T. L., Skundin, A. M., Bruk, M. A., Klochikhina, A. V., Kozlova, N. V., Kal’nov, V. A., Loginov, B. A.

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Measurements of linear dimensions of silicon nanorelief elements with a near-rectangular profile by defocusing the electron probe of a scanning electron microscope von Valiev, K. A., Gavrilenko, V. P., Zhikharev, E. N., Danilova, M. A., Kal’nov, V. A., Larionov, Yu. V., Mityukhlyaev, V. B., Orlikovskii, A. A., Rakov, A. V., Todua, P. A., Filippov, M. N.

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The direct resist-free deposition of a lithographic mask from vapor initiated by an electron beam von Bruk, M. A., Zhikharev, E. N., Shevchuk, S. L., Volegova, I. A., Spirin, A. V., Teleshov, E. N., Kal’nov, V. A., Maishev, Yu. P.

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Features of resist-free formation of masking pattern by electron beam-induced vapor deposition von Bruk, M. A., Zhikharev, E. N., Shevchuk, S. L., Volegova, I. A., Spirin, A. V., Teleshov, E. N., Kal’nov, V. A., Maishev, Yu. P.

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Observation of X-ray refraction contrast using multilayer mirrors with resonant absorption von PROTOPOPOV, V. V, KALNOV, V. A

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X-ray multilayer mirrors with wide angular range von Kalnov, V. A., Protopopov, V. V., Valiev, K. A., Imamov, R. M.

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Human rotavirus infection. Strategies for the vaccinal prevention von Alekseev, K. P., Kalnov, S. L., Grebennikova, T. V., Aliper, T. I.

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