Fabrication and investigation of three-dimensional ferroelectric capacitors for the application of FeRAM von Yeh, Chia-Pin, Lisker, Marco, Kalkofen, Bodo, Burte, Edmund P.

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Atomic Layer Deposition of the Conductive Delafossite PtCoO2 von Hagen, Dirk J., Yoon, Jiho, Zhang, Haojie, Kalkofen, Bodo, Silinskas, Mindaugas, Börrnert, Felix, Han, Hyeon, Parkin, Stuart S. P.

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Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon von Kalkofen, Bodo, Amusan, Akinwumi A., Bukhari, Muhammad S. K., Garke, Bernd, Lisker, Marco, Gargouri, Hassan, Burte, Edmund P.

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High temperature reactive ion etching of iridium thin films with aluminum mask in CF4/O2/Ar plasma von Yeh, Chia-Pin, Lisker, Marco, Kalkofen, Bodo, Burte, Edmund P.

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Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon von Beljakowa, Svetlana, Pichler, Peter, Kalkofen, Bodo, Hübner, René

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Ag films grown by remote plasma enhanced atomic layer deposition on different substrates von Amusan, Akinwumi A., Kalkofen, Bodo, Gargouri, Hassan, Wandel, Klaus, Pinnow, Cay, Lisker, Marco, Burte, Edmund P.

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Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process von Baik, Seunghun, Kwon, Hyeokjin, Paeng, Chuck, Zhang, He, Kalkofen, Bodo, Jang, Jae Eun, Kim, Y. S., Kwon, Hyuk-Jun

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Atomic Layer Deposition of the Conductive Delafossite PtCoO 2 von Hagen, Dirk J., Yoon, Jiho, Zhang, Haojie, Kalkofen, Bodo, Silinskas, Mindaugas, Börrnert, Felix, Han, Hyeon, Parkin, Stuart S. P.

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Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds von Šilinskas, Mindaugas, Kalkofen, Bodo, Balasubramanian, Ramasubramanian, Batmanov, Anatoliy, Burte, Edmund P., Harmgarth, Nicole, Zörner, Florian, Edelmann, Frank T., Garke, Bernd, Lisker, Marco

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Investigation of oxide thin films deposited by atomic layer deposition as dopant source for ultra-shallow doping of silicon: Insulating Films on Semiconductors 2013 von KALKOFEN, Bodo, AMUSAN, Akinwumi A, LISKER, Marco, BURTE, Edmund P

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Use of B{sub 2}O{sub 3} films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon von Kalkofen, Bodo, Amusan, Akinwumi A., Bukhari, Muhammad S. K., Burte, Edmund P., Garke, Bernd, Lisker, Marco, Gargouri, Hassan

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Application of atomic layer deposited dopant sources for ultra-shallow doping of silicon von Kalkofen, Bodo, Amusan, Akinwumi A., Lisker, Marco, Burte, Edmund P.

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P-type Doping of Silicon Suitable for Structures with High Aspect Ratios by Using a Dopant Source of Boron Oxide Grown by Atomic Layer Deposition von Kalkofen, Bodo, Mothukuru, Venu Madhav, Lisker, Marco, Burte, Edmund P.

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Investigation of oxide thin films deposited by atomic layer deposition as dopant source for ultra-shallow doping of silicon von Kalkofen, Bodo, Amusan, Akinwumi A., Lisker, Marco, Burte, Edmund P.

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Deposition of Iridium Thin Films on Three-Dimensional Structures With PE-MOCVD von Yeh, Chia-Pin, Lisker, Marco, Bläsing, Jürgen, Khorkhordin, Oleksandr, Kalkofen, Bodo, Burte, Edmund P.

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Investigation of Antimony Oxide Films Deposited by Atomic Layer Deposition von Kalkofen, Bodo, Mothukuru, Venu Madhav, Klingsporn, Max, Burte, Edmund P.

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Observation of steplike sheet resistance increase of shallow doped bare silicon during initial contact to air von Kalkofen, Bodo, Burte, Edmund P.

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Enhanced Ferroelectric Properties of Multilayer SBT-BTN Thin Films for NVRAM Applications von Khorkhordin, Oleksandr, Yeh, Chia-Pin, Kalkofen, Bodo, Burte, Edmund

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Atomic Layer Deposition of Antimony Oxide on Hydrogen-terminated Silicon Substrates von Kalkofen, Bodo, Matichyn, Serhiy, Burte, Edmund

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Hot-Wire Chemical Vapor Deposition of Ge 2 Sb 2 Te 5 Thin Films von Reso, Denis, Silinskas, Mindaugas, Kalkofen, Bodo, Lisker, Marco, Burte, Edmund P.

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