Photoluminescence from microcrystalline CuCl films grown from the amorphous phase von Kondo, S, Kakuchi, M, Saito, T

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Relationship between duration of prehospital resuscitation and favorable prognosis in ventricular fibrillation von Arima, Takahiro, MD, Nagata, Osamu, MD, Sakaida, Koji, MD, Miura, Takeshi, MD, Kakuchi, Hiroyuki, MD, Ikeda, Katsuki, MD, Mizushima, Tomoya, MD, Takahashi, Azusa, MD

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Polypyrrole-based conducting polymer alloy films: physical properties and film morphology von Niwa, Osamu, Kakuchi, Masami, Tamamura, Toshiaki

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An X-ray mask using SiC membrane deposited by ECR plasma CVD von Oda, M., Ohkubo, T., Ozawa, A., Ohki, S., Kakuchi, M., Yoshihara, H.

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Amorphous carbon films as resist masks with high reactive ion etching resistance for nanometer lithography von KAKUCHI, M, HIKITA, M, TAMAMURA, T

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Impact of inflow reduction of arteriovenous fistula on systemic hemodynamics in a patient with high-output heart failure during hemodialysis: A case report von Oe, Kotaro, MD, Araki, Tsutomu, MD, FJCC, Katano, Kenichi, MD, Kakuchi, Yasushi, MD, Nakashima, Akikatsu, MD, Konno, Tetsuo, MD, Fujino, Noboru, MD, Ino, Hidekazu, MD, FJCC, Yamagishi, Masakazu, MD, FJCC

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X‐ray image monitoring using a new soft x‐ray plate: Ag/chalcogenide film von Utsugi, Yasushi, Kakuchi, Masami, Maezawa, Hideki

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Cell-type optical circuitry fabrication von Kakuchi, M

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High-accuracy X-ray masks with sub-half-micron 1M-DRAM chips von Ohki, Shigehisa, Oda, Masatoshi, Kakuchi, Masami, Yoshihara, Hideo

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Ta/SiN-Structure X-Ray Masks for Sub-Half-Micron LSIs von Ohki, Shigehisa, Kakuchi, Masami, Matsuda, Tadahito, Ozawa, Akira, Ohkubo, Takashi, Oda, Masatoshi, Yoshihara, Hideo

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Soft x‐ray microscope at the undulator beamline of the Photon Factory von Kagoshima, Yasushi, Aoki, Sadao, Kakuchi, Masami, Sekimoto, Misao, Maezawa, Hideki, Hyodo, Kazuyuki, Ando, Masami

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Image formation of periodic objects illuminated by undulator radiation in a zone plate microscope von KAGOSHIMA, Y, AOKI, S, KAKUCHI, M, MAEZAWA, H, ANDO, M

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Poly (Fluoro Methacrylate) as Highly Sensitive, High Contrast Positive Resist von Kakuchi, Masami, Sugawara, Shungo, Murase, Kei, Matsuyama, Kentaro

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Nanometer patterning by focused low energy electron beam lithography von SUGITA, A, KAKUCHI, M, TAMAMURA, T

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Electrically conducting two-layer resist system using amorphous carbon films von KAKUCHI, M, HIKITA, M, SUGITA, A, ONOSE, K, TAMAMURA, T

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Anomalous plasma acceleration in colliding high-power laser-produced plasmas von Morita, T., Nagashima, K., Edamoto, M., Tomita, K., Sano, T., Itadani, Y., Kumar, R., Ota, M., Egashira, S., Yamazaki, R., Tanaka, S. J., Tomita, S., Tomiya, S., Toda, H., Miyata, I., Kakuchi, S., Sei, S., Ishizaka, N., Matsukiyo, S., Kuramitsu, Y., Ohira, Y., Hoshino, M., Sakawa, Y.

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A Zone Plate Soft X-Ray Microscope Using Undulator Radiation at the Photon Factory von Kagoshima, Y., Aoki, S., Kakuchi, M., Sekimoto, M., Maezawa, H., Hyodo, K., Ando, M.

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X-Ray Zone Plate with Tantalum Film for an X-Ray Microscope von Sekimoto, M., Ozawa, A., Ohkubo, T., Yoshihara, H., Kakuchi, M., Tamamura, T.

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Rapid pyrolysis of wood block by microwave heating von Miura, Masakatsu, Kaga, Harumi, Sakurai, Akihiko, Kakuchi, Toyoji, Takahashi, Kenji

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High-power laser experiment forming a supercritical collisionless shock in a magnetized uniform plasma at rest von Yamazaki, R, Matsukiyo, S, Morita, T, Tanaka, S J, Umeda, T, Aihara, K, Edamoto, M, Egashira, S, Hatsuyama, R, Higuchi, T, Hihara, T, Horie, Y, Hoshino, M, Ishii, A, Ishizaka, N, Itadani, Y, Izumi, T, Kambayashi, S, Kakuchi, S, Katsuki, N, Kawamura, R, Kawamura, Y, Kisaka, S, Kojima, T, Konuma, A, Kumar, R, Minami, T, Miyata, I, Moritaka, T, Murakami, Y, Nagashima, K, Nakagawa, Y, Nishimoto, T, Nishioka, Y, Ohira, Y, Ohnishi, N, Ota, M, Ozaki, N, Sano, T, Sakai, K, Sei, S, Shiota, J, Shoji, Y, Sugiyama, K, Suzuki, D, Takagi, M, Toda, H, Tomita, S, Tomiya, S, Yoneda, H, Takezaki, T, Tomita, K, Kuramitsu, Y, Sakawa, Y

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