Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH4/H2 at 300–500 °C von Kako, Takashi, Liu, Zecheng, Ishikawa, Kenji, Kondo, Hiroki, Oda, Osamu, Sekine, Makoto, Hori, Masaru

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Promenade of Applied Mathematics(91) Some Further Topics and Future Perspectives von Kako, Takashi

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Promenade of Applied Mathematics(90) Acquainted with Various People in Various Occasions von Kako, Takashi

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Promenade of Applied Mathematics(89) Toward Several Research Fields von Kako, Takashi

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Promenade of Applied Mathematics(88) Journey to Industrial and Applied Mathematics von Kako, Takashi

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Suppression of plasma-induced damage on GaN etched by a Cl 2 plasma at high temperatures von Liu, Zecheng, Pan, Jialin, Kako, Takashi, Ishikawa, Kenji, Takeda, Keigo, Kondo, Hiroki, Oda, Osamu, Sekine, Makoto, Hori, Masaru

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Suppression of plasma-induced damage on GaN etched by a Cl2 plasma at high temperatures von Liu, Zecheng, Pan, Jialin, Kako, Takashi, Ishikawa, Kenji, Takeda, Keigo, Kondo, Hiroki, Oda, Osamu, Sekine, Makoto, Hori, Masaru

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Application for a Novel Perturbation Expansion Method von Deng, Li, Douglas, Craig C., Haase, Gundolf, Kako, Takashi, Hagiwara, Ichiro

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Preface von Kako, Takashi, Magoulès, Frédéric, Suito, Hiroshi

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Numerical Method for Antenna Radiation Problem by FDTD Method with PML von Kako, Takashi, Ohi, Yoshiharu

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ETCHING METHOD AND PLASMA PROCESSING APPARATUS von KAKO, Takashi, TANAKA, Koki, NAGAI, Ryu

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A novel perturbation expansion method for coupled system of acoustics and structures von Li, Deng, Douglas, C.C., Kako, Takashi, Masabumi, Suzuki, Ichiro, Hagiwara

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Numerical Method for Wave Propagation Problem by FDTD Method with PML von Kako, Takashi, Ohi, Yoshiharu

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Approximation of Exterior Dirichlet Problems; Convergence of Wave and Scattering Operators von Kako, Takashi

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Mechanism of plasma etching on gallium nitride at high temperature (4) von Liu, Zecheng, Kako, Takashi, Ishikawa, Kenji, Oda, Osamu, Takeda, Keigo, Kondo, Hiroki, Sekine, Makoto, Hori, Masaru

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CH4/H2 plasma etching on gallium nitride at high temperature von Kako, Takashi, Liu, Zecheng, Ishikawa, Kenji, Oda, Osamu, Takeda, Keigo, Kondo, Hiroki, Sekine, Makoto, Hori, Masaru

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ETCHING METHOD AND PLASMA PROCESSING APPARATUS von TANAKA KOKI, KAKO TAKASHI, NAGAI RYU

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ETCHING METHOD AND PLASMA PROCESSING APPARATUS von TANAKA KOKI, KAKO TAKASHI, NAGAI RYU

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Etching method and plasma processing apparatus von TANAKA KOKI, KAKO TAKASHI, NAGAI RYU

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Expectation for the New Role of the Industrial and Applied Mathematics von Kako, Takashi

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