Isobutyl Silane Precursors for SiCH Low-$k$ Cap Layer beyond the 22 nm Node: Analysis of Film Structure for Compatibility of Lower $k$-value and High Barrier Properties von Shimizu, Hideharu, Tajima, Nobuo, Kada, Takeshi, Nagano, Shuji, Shimogaki, Yukihiro

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Novel Precursor for Development of Si--C2H4--Si Networks in SiCH for Application as a Low-$k$ Cap Layer beyond 22 nm Nodes von Shimizu, Hideharu, Tajima, Nobuo, Kada, Takeshi, Nagano, Shuji, Ohashi, Yoshi, Hasaka, Satoshi

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Ni Thin Film Deposition from Tetrakistrifluorophosphine-Nickel von Ohshita, Yoshio, Ishikawa, Masato, Kada, Takeshi, Machida, Hideaki, Ogura, Atsushi

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Fabrication of refractive index distributions in polymer using a photochemical reaction von Kada, Takeshi, Obara, Atsushi, Watanabe, Toshiyuki, Miyata, Seizo, Liang, Chuan Xin, Machida, Hideaki, Kiso, Koichi

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Ni Precursor for Chemical Vapor Deposition of NiSi von Ishikawa, Masato, Kada, Takeshi, Machida, Hideaki, Ohshita, Yoshio, Ogura, Atsushi

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Novel Precursors for SiCH Low-$k$ Caps beyond the 22 nm Node: Reactions of Silacyclopentane Precursors in the Plasma-Enhanced Chemical Vapor Deposition Process and Structural Analy... von Shimizu, Hideharu, Tajima, Nobuo, Kada, Takeshi, Nagano, Shuji, Shimogaki, Yukihiro

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TRIS-DIETHYLAMINO-SILANE DECOMPOSITION DUE TO TETRAKIS-DIETHYLAMIDO-HAFNIUM IN Hf1-xSixO2 CHEMICAL VAPOR DEPOSITION von Ohshita, Y, Ogura, A, Ishikawa, M, Kada, T, Machida, H

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Fabrication of Refractive Index Profiles in Poly (Methyl Methacrylate) using Ultraviolet Rays Irradiation von Kada, Takeshi, Hiramatsu, Takeyoshi, Ogino, Kenji, Liang, Chuang Xin, Machida, Hideaki, Kiso, Koichi, Miyata, Seizo

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Novel Precursors for SiCH Low- k Caps beyond the 22 nm Node: Reactions of Silacyclopentane Precursors in the Plasma-Enhanced Chemical Vapor Deposition Process and Structural Analys... von Shimizu, Hideharu, Tajima, Nobuo, Kada, Takeshi, Nagano, Shuji, Shimogaki, Yukihiro

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Isobutyl Silane Precursors for SiCH Low- k Cap Layer beyond the 22 nm Node: Analysis of Film Structure for Compatibility of Lower k -value and High Barrier Properties von Shimizu, Hideharu, Tajima, Nobuo, Kada, Takeshi, Nagano, Shuji, Shimogaki, Yukihiro

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Information processing method and system for executing the information method von Kada, Takeshi

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INFORMATION PROCESSING METHOD, PROGRAM FOR EXECUTING INFORMATION METHOD ON COMPUTER von KADA, Takeshi

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Proposal of New Precursors for Plasma-Enhanced Chemical Vapor Deposition of SiOCH Low-$k$ Films with Plasma Damage Resistance von Ohashi, Yoshi, Tajima, Nobuo, Xu, Yonghua, Kada, Takeshi, Nagano, Shuji, Shimizu, Hideharu, Hasaka, Satoshi

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Information processing method and system for executing the information processing method von Kada Takeshi

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INFORMATION PROCESSING METHOD AND SYSTEM FOR EXECUTING THE INFORMATION PROCESSING METHOD von KADA Takeshi

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MATCHING METHOD AND MATCHING SYSTEM FOR USERS IN GAME von KADA Takeshi

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Novel Precursor for Development of Si–C 2 H 4 –Si Networks in SiCH for Application as a Low-k Cap Layer beyond 22 nm Nodes von Shimizu, Hideharu, Tajima, Nobuo, Kada, Takeshi, Nagano, Shuji, Ohashi, Yoshi, Hasaka, Satoshi

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Surface reactions in Ni MOCVD using cyclopentadienylallylnickel as a precursor von Ishikawa, Masato, Kada, Takeshi, Machida, Hideaki, Soai, Kensou, Ogura, Atsushi, Ohshita, Yoshio

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HfO2 and Hf1-xSixO2 Thin Films Grown by Metal-Organic CVD Using Tetrakis(diethylamido)hafnium von Ohshita, Y., Ogura, A., Ishikawa, M., Kada, T., Hoshino, A., Suzuki, T., Machida, H., Soai, K.

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Information processing method and system for executing the information processing method von Kono, Yuki, Kada, Takeshi, Kondo, Ippei

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