High rate deposition of photoactive TiO2 films by hot hollow cathode von Olejníček, J., Šmíd, J., Čada, M., Kšírová, P., Kohout, M., Perekrestov, R., Tvarog, D., Kment, Š., Kmentová, H., Hubička, Z.

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Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system von Hubička, Z., Kment, Š., Olejníček, J., Čada, M., Kubart, T., Brunclíková, M., Kšírová, P., Adámek, P., Remeš, Z.

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The comparative study of electrical, optical and catalytic properties of Co3O4 thin nanocrystalline films prepared by reactive high-power impulse and radio frequency magnetron sput... von Perekrestov, R., Spesyvyi, A., Maixner, J., Mašek, K., Leiko, O., Khalakhan, I., Maňák, J., Kšírová, P., Hubička, Z., Čada, M.

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Fe-Ti alloy layer plasma deposition – Monitoring of plasma parameters and properties of deposited alloys, anodization and photoelectrochemical characterization von Olejníček, J., Zlámal, M., Hubička, Z., Perekrestov, R., Kšírová, P., Čada, M., Kment, Š., Krýsa, J.

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Investigation of reactive HiPIMS+MF sputtering of TiO2 crystalline thin films von Olejníček, J., Hubička, Z., Kment, Š., Čada, M., Kšírová, P., Adámek, P., Gregora, I.

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On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method von Kment, S., Hubicka, Z., Krysa, J., Sekora, D., Zlamal, M., Olejnicek, J., Cada, M., Ksirova, P., Remes, Z., Schmuki, P., Schubert, E., Zboril, R.

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Deposition of cobalt oxide films by reactive pulsed magnetron sputtering von Hippler, R., Cada, M., Ksirova, P., Olejnicek, J., Jiricek, P., Houdkova, J., Wulff, H., Kruth, A., Helm, C.A., Hubicka, Z.

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Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers von Hippler, R., Hubicka, Z., Cada, M., Ksirova, P., Wulff, H., Helm, C. A., Stranak, V.

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Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode von Stranak, V., Kratochvil, J., Olejnicek, J., Ksirova, P., Sezemsky, P., Cada, M., Hubicka, Z.

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ZnO thin films prepared by surfatron produced discharge von OLEJNICEK, J, SMID, J, CHVOSTOVA, D, ZLAMAL, M, HUBICKA, Z, CADA, M, KMENT, S, CHURPITA, O, KSIROVA, P, BRUNCLIKOVA, M, ADAMEK, P, KOHOUT, M, VALVODA, V

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Semiconducting WO3 thin films prepared by pulsed reactive magnetron sputtering von Brunclíková, M., Hubička, Z., Kment, Š., Olejníček, J., Čada, M., Kšírová, P., Krýsa, J.

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Epoxy catalyzed sol–gel method for pinhole-free pyrite FeS2 thin films von Kment, S., Kmentova, H., Sarkar, A., Soukup, R.J., Ianno, N.J., Sekora, D., Olejnicek, J., Ksirova, P., Krysa, J., Remes, Z., Hubicka, Z.

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Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture von Hubicka, Z., Cada, M., Kapran, A., Olejnicek, J., Ksiroya, P., Zanaska, M., Adamek, P., Tichy, M.

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Epoxy catalyzed sol-gel method for pinhole-free pyrite FeS sub(2) thin films von Kment, S, Kmentova, H, Sarkar, A, Soukup, R J, Ianno, N J, Sekora, D, Olejnicek, J, Ksirova, P, Krysa, J, Remes, Z, Hubicka, Z

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