Real-time monitoring of uranium concentration in NaCl–MgCl2–UCl3 molten salt von Jung, Chan-Yong, Kim, Tae-Hyeong, Bae, Sang-Eun

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Low-thermal-budget (300 °C) ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors realized using high-pressure annealing von Kim, Si Joon, Jung, Yong Chan, Mohan, Jaidah, Kim, Hyo Jeong, Rho, Sung Min, Kim, Min Seong, Yoo, Jeong Gyu, Park, Hye Ryeon, Hernandez-Arriaga, Heber, Kim, Jin-Hyun, Kim, Hyung Tae, Choi, Dong Hyun, Jung, Joohye, Hwang, Su Min, Sejoon Kim, Harrison, Kim, Hyun Jae, Kim, Jiyoung

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Improvement in ferroelectricity and breakdown voltage of over 20-nm-thick HfxZr1−xO2/ZrO2 bilayer by atomic layer deposition von Onaya, Takashi, Nabatame, Toshihide, Inoue, Mari, Jung, Yong Chan, Hernandez-Arriaga, Heber, Mohan, Jaidah, Kim, Harrison Sejoon, Sawamoto, Naomi, Nagata, Takahiro, Kim, Jiyoung, Ogura, Atsushi

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Internal Calibration System Using Learning Algorithm With Gradient Descent von Jung, Chan-Yong, Bae, Kyung-Bin, Kim, Dong-Chan, Park, Seong-Ook

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Adsorption of Tetrachloroplatinate Complex on Gold Surfaces in Perchloric and Sulfuric Acids von Jung, Chan‐Yong, Lee, Chi‐Woo

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High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor von Kim, Harrison Sejoon, Hwang, Su Min, Meng, Xin, Byun, Young-Chul, Jung, Yong Chan, Ravichandran, Arul Vigneswar, Sahota, Akshay, Kim, Si Joon, Ahn, Jinho, Lee, Lance, Zhou, Xiaobing, Hwang, Byung Keun, Kim, Jiyoung

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Electrochemical Atomic Layer Deposition of CuInSe2 on Au Surface von Jung, Chan‐Yong, Ramasamy, Mukunthan, Yeon, Yu‐Beom, Lee, Chi‐Woo

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Mo/CIGS/CdS Structures by E‐ALD von Ramasamy, Mukunthan, Jung, Chan‐Yong, Yeon, Yu‐Beom, Lee, Chi‐Woo

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Nano-polycrystalline Ag-doped ZnO layer for steep-slope threshold switching selectors von Sahota, Akshay, Kim, Harrison Sejoon, Mohan, Jaidah, Le, Dan N., Jung, Yong Chan, Kim, Si Joon, Lee, Jang-Sik, Ahn, Jinho, Hernandez-Arriaga, Heber, Kim, Jiyoung

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LGP2 expression is enhanced by interferon regulatory factor 3 in olive flounder, Paralichthys olivaceus von Hikima, Jun-Ichi, Yi, Mi-Kyong, Ohtani, Maki, Jung, Chan Yong, Kim, Young Kyu, Mun, Ji Young, Kim, Young Rim, Takeyama, Haruko, Aoki, Takashi, Jung, Tae Sung

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Radical-Driven Crystal–Amorphous–Crystal Transition of a Metal–Organic Framework von Park, Seonghun, Lee, Juhyung, Kim, Bongkyeom, Jung, Chan-Yong, Bae, Sang-Eun, Kang, Joongoo, Moon, Dohyun, Park, Jinhee

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Ferroelectric polarization retention with scaling of Hf0.5Zr0.5O2 on silicon von Mohan, Jaidah, Hernandez-Arriaga, Heber, Jung, Yong Chan, Onaya, Takashi, Nam, Chang-Yong, Tsai, Esther H. R., Kim, Si Joon, Kim, Jiyoung

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In situ deposition behavior of SiO2 on YSZ-TBC-coated IN738LC during a burner rig test von Kim, Min Tae, Jung, Yong Chan, Seo, Dongyi

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Synthesis of Ag-ZnO core-shell nanoparticles with enhanced photocatalytic activity through atomic layer deposition von Seong, Sejong, Park, In-Sung, Jung, Yong Chan, Lee, Taehoon, Kim, Seon Yong, Park, Ji Soo, Ko, Jae-Hyeon, Ahn, Jinho

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Dielectric function of Si1−xGex films grown on silicon-on-insulator substrates von Park, In-Sung, Chan Jung, Yong, Ahn, Jinho, Shim, Tae-Hun, Lee, Du-Yeong, Park, Jea-Gun

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Pt Monolayer Creation on a Au Surface via an Underpotentially Deposited Cu Route von Qu, Deyu, Jung, Chan-Yong, Lee, Chi-Woo, Uosaki, Kohei

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Robust low-temperature (350 °C) ferroelectric Hf0.5Zr0.5O2 fabricated using anhydrous H2O2 as the ALD oxidant von Jung, Yong Chan, Kim, Jin-Hyun, Hernandez-Arriaga, Heber, Mohan, Jaidah, Hwang, Su Min, Le, Dan N., Sahota, Akshay, Kim, Harrison Sejoon, Kim, Kihyun, Choi, Rino, Nam, Chang-Yong, Alvarez, Daniel, Spiegelman, Jeffrey, Kim, Si Joon, Kim, Jiyoung

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A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films von Kim, Si Joon, Mohan, Jaidah, Kim, Harrison Sejoon, Hwang, Su Min, Kim, Namhun, Jung, Yong Chan, Sahota, Akshay, Kim, Kihyun, Yu, Hyun-Yong, Cha, Pil-Ryung, Young, Chadwin D., Choi, Rino, Ahn, Jinho, Kim, Jiyoung

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Low‐Thermal‐Budget Fluorite‐Structure Ferroelectrics for Future Electronic Device Applications von Kim, Hyo Jeong, An, Yonghwan, Jung, Yong Chan, Mohan, Jaidah, Yoo, Jeong Gyu, Kim, Young In, Hernandez-Arriaga, Heber, Kim, Harrison Sejoon, Kim, Jiyoung, Kim, Si Joon

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Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications von Le, Dan N., Park, Taehee, Hwang, Su Min, Kim, Jin-Hyun, Jung, Yong Chan, Tiwale, Nikhil, Subramanian, Ashwanth, Lee, Won-Il, Choi, Rino, Sung, Myung M., Nam, Chang-Yong, Kim, Jiyoung

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