Treffer 1 - 7 von 7 für Suche 'Ju, Byongsun', Suchdauer: 0,37s Treffer weiter einschränken
  1. 1
    Investigation on the Retention Reliability of Scaled hbox SiO 2 / hbox Al x hbox O y / hbox SiO 2 Inter-Poly Dielectrics for nand Flash Cell Arrays

    Investigation on the Retention Reliability of Scaled hbox SiO 2 / hbox Al x hbox O y / hbox SiO 2 Inter-Poly Dielectrics for nand Flash Cell Arrays von Lee, Se Hoon, Park, Mincheol, Choi, Byung Yong, Sung, Suk-Kang, Kim, Tae Hun, Ju, Byongsun, Kim, Dong Chan, Lee, Choong-Ho, Kim, Keonsoo, Choi, Jungdal, Kim, Kinam

    Veröffentlicht in IEEE electron device letters

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  2. 2
    Investigation on the Retention Reliability of Scaled \hbox/\hbox\hbox/\hbox Inter-Poly Dielectrics for nand Flash Cell Arrays

    Investigation on the Retention Reliability of Scaled \hbox/\hbox\hbox/\hbox Inter-Poly Dielectrics for nand Flash Cell Arrays von Se Hoon Lee, Mincheol Park, Byung Yong Choi, Suk-Kang Sung, Tae Hun Kim, Byongsun Ju, Dong Chan Kim, Choong-Ho Lee, Keonsoo Kim, Jungdal Choi, Kinam Kim

    Veröffentlicht in IEEE electron device letters

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  3. 3
    Investigation on the Retention Reliability of Scaled [Formula Omitted] Inter-Poly Dielectrics for nand Flash Cell Arrays

    Investigation on the Retention Reliability of Scaled [Formula Omitted] Inter-Poly Dielectrics for nand Flash Cell Arrays von Lee, Se Hoon, Park, Mincheol, Choi, Byung Yong, Sung, Suk-Kang, Kim, Tae Hun, Ju, Byongsun, Kim, Dong Chan, Lee, Choong-Ho, Kim, Keonsoo, Choi, Jungdal, Kim, Kinam

    Veröffentlicht in IEEE electron device letters

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  4. 4
    Performance and reliability improvement of HfSiON gate dielectrics using chlorine plasma treatment

    Performance and reliability improvement of HfSiON gate dielectrics using chlorine plasma treatment von Park, Hong Bae, Ju, Byongsun, Kang, Chang Yong, Park, Chanro, Park, Chang Seo, Lee, Byoung Hun, Kim, Tea Wan, Kim, Beom Seok, Choi, Rino

    Veröffentlicht in Applied physics letters

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  5. 5
    Investigation on the Retention Reliability of Scaled SiO2/AlxOy/SiO2 Inter-Poly Dielectrics for NAND Flash Cell Arrays

    Investigation on the Retention Reliability of Scaled SiO2/AlxOy/SiO2 Inter-Poly Dielectrics for NAND Flash Cell Arrays von SE HOON LEE, PARK, Mincheol, KIM, Kinam, BYUNG YONG CHOI, SUNG, Suk-Kang, TAE HUN KIM, JU, Byongsun, DONG CHAN KIM, LEE, Choong-Ho, KIM, Keonsoo, CHOI, Jungdal

    Veröffentlicht in IEEE electron device letters

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  6. 6
    A Study On The High Temperture Platinum Etching

    A Study On The High Temperture Platinum Etching von Hyounwoo Kim, Byongsun Ju, Beongyoon Nam, Wonjong Yoo, Changjln Kang, Jootae Moon, Moonyong Lee

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  7. 7
    Suppression of the ERK–SRF axis facilitates somatic cell reprogramming

    Suppression of the ERK–SRF axis facilitates somatic cell reprogramming von Huh, Sejong, Song, Hwa-Ryung, Jeong, Geuk-Rae, Jang, Hyejin, Seo, Nan-Hee, Lee, Ju-Hyun, Yi, Ji-Yeun, Lee, Byongsun, Choi, Hyun Woo, Do, Jeong Tae, Kim, Jin-Su, Lee, Soo-Hong, Jung, Jae-Won, Lee, Taekyu, Shim, Jaekyung, Han, Myung-Kwan, Lee, Tae-Hee


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