Systematic Study on the Amorphous, C‑Axis-Aligned Crystalline, and Protocrystalline Phases in In–Ga–Zn Oxide Thin-Film Transistors von Glushkova, Anastasia V, Dekkers, Harold F. W, Nag, Manoj, del Agua Borniquel, Jose Ignacio, Ramalingam, Jothilingam, Genoe, Jan, Heremans, Paul, Rolin, Cedric

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Improvement in drain-induced-barrier-lowering and on-state current characteristics of bulk Si fin field-effect-transistors using high temperature Phosphorus extension ion implantat... von Kikuchi, Yoshiaki, Hopf, Toby, Mannaert, Geert, Everaert, Jean-Luc, Kubicek, Stefan, Eyben, Pierre, Waite, Andrew, del Agua Borniquel, Jose Ignacio, Variam, Naushad, Mocuta, Dan, Horiguchi, Naoto

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Sub-40mV Sigma-VTH IGZO nFETs in 300mm Fab von Mitard, Jerome, Kljucar, Luka, Rassoul, Nouredine, Dekkers, Harold, Michiel van Setten, Adrian Vaisman Chasin, Pourtois, Geoffrey, Belmonte, Attilio, Donadio, Gabriele Luca, Goux, Ludovic, Mao, Ming, Harinarayanan Puliyalil, Teugels, Lieve, Tsvetanova, Diana, Nag, Manoj, Steudel, Soeren, Jose Ignacio del Agua Borniquel, Ramalingam, Jothilingam, Delhougne, Romain, Wilson, Chris J, Tokei, Zsolt, Kar, Gouri Sankar

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AlGaN/GaN/AlGaN Double Heterostructures Grown on 200 mm Silicon (111) Substrates with High Electron Mobility von Cheng, Kai, Liang, Hu, Hove, Marleen Van, Geens, Karen, Jaeger, Brice De, Srivastava, Puneet, Kang, Xuanwu, Favia, Paola, Bender, Hugo, Decoutere, Stefaan, Dekoster, Johan, Borniquel, Jose Ignacio del Agua, Jun, Sung Won, Chung, Hua

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(Invited) Sub-40mV Sigma VTH Igzo nFETs in 300mm Fab von Mitard, Jerome, Kljucar, Luka, Rassoul, Nouredine, Dekkers, Harold F. W., van Setten, Michiel, Chasin, Adrian, Pourtois, Geoffrey, Belmonte, Attilio, Delhougne, Romain, Donadio, Gabriele Luca, Goux, Ludovic, Nag, Manoj, Wilson, Chris, Tokei, Zsolt, Borniquel, Jose Ignacio del agua, Steudel, Soeren, Kar, Gouri Sankar

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(Invited) Sub-40mV Sigma V TH Igzo nFETs in 300mm Fab von Mitard, Jerome, Kljucar, Luka, Rassoul, Nouredine, Dekkers, Harold F. W., van Setten, Michiel, Chasin, Adrian, Pourtois, Geoffrey, Belmonte, Attilio, Delhougne, Romain, Donadio, Gabriele Luca, Goux, Ludovic, Nag, Manoj, Wilson, Chris, Tokei, Zsolt, Borniquel, Jose Ignacio del agua, Steudel, Soeren, Kar, Gouri Sankar

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Method for forming a film of an oxide of In, Ga, and Zn von Dekkers, Hendrik F. W, del Agua Borniquel, Jose Ignacio

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Methods and apparatuses for depositing amorphous silicon atop metal oxide von Yim, Dong Kil, Borniquel, Jose-Ignacio Del-Agua

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Poly-Silicon Etch with Diluted Ammonia: Application to Replacement Gate Integration Scheme von Baiya, Evans, Chiarella, Thomas, Vrancken, Christa, Vos, Rita, Absil, Philippe, Del Agua Borniquel, Jose Ignacio, Boelen, Pieter, Sebaai, Farid

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METHODS AND APPARATUSES FOR DEPOSITING AMORPHOUS SILICON ATOP METAL OXIDE von Borniquel, Jose-Ignacio Del-Agua, YIM, Dong Kil

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METHODS AND APPARATUS FOR DEPOSITING AMORPHOUS SILICON ATOP METAL OXIDE AND STRUCTURES FORMED BY SAME von BORNIQUEL, Jose-Ignacio Del-Agua, YIM, Dong Kil

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METHOD FOR FORMING A FILM OF AN OXIDE OF In, Ga, AND Zn von del Agua Borniquel, Jose Ignacio, Dekkers, Hendrik F.W

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METHOD FOR FORMING A FILM OF AN OXIDE OF IN, GA, AND ZN von DEKKERS, Hendrik F.W, DEL AGUA BORNIQUEL, Jose Ignacio

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Oxygen vacancy of amorphous indium gallium zinc oxide passivation by silicon ion treatment von Dekkers, Hendrik F. W, Del-Agua-Borniquel, Jose-Ignacio, Van Meer, Hans, Lee, Jae Young

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Performance Enhancement of PFET Planar Devices by Plasma Immersion Ion Implantation (P3I) von Ortolland, Claude, Horiguchi, Naoto, Kerner, Christoph, Chiarella, Thomas, Eyben, Pierre, Everaert, Jean-Luc, del Agua Borniquel, Jose Ignacio, Poon, Tze, Santhanam, Kartik, Porshnev, Peter, Foad, Majeed, Schreutelkamp, Robert, Absil, Philippe, Vandervorst, Wilfried, Felch, Susan, Hoffmann, Thomas

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OXYGEN VACANCY OF AMORPHOUS INDIUM GALLIUM ZINC OXIDE PASSIVATION BY SILICON ION TREATMENT von Del-Agua-Borniquel, Jose-Ignacio, Van Meer, Hans, Lee, Jae Young, Dekkers, Hendrik F.W

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(Invited) Sub-40mV Sigma V TH Igzo nFETs in 300mm Fab von Mitard, Jerome, Kljucar, Luka, Rassoul, Nouredine, Dekkers, Harold F. W., van Setten, Michiel, Chasin, Adrian, Pourtois, Geoffrey, Belmonte, Attilio, Delhougne, Romain, Donadio, Gabriele Luca, Goux, Ludovic, Nag, Manoj, Wilson, Chris, Tokei, Zsolt, Borniquel, Jose Ignacio del agua, Steudel, Soeren, Kar, Gouri Sankar

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ION IMPLANTED SUBSTRATE HAVING CAPPING LAYER AND METHOD von DEL AGUA BORNIQUEL, JOSE IGNACIO, FOAD, MAJEED, POON, TZE, SCHREUTELKAMP, ROBERT

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Ion implanted substrate having capping layer and method von Del Agua Borniquel, Jose Ignacio, Poon, Tze, Schreutelkamp, Robert, Foad, Majeed

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Ion implanted substrate having capping layer and method von DEL AGUA BORNIQUEL JOSE IGNACIO, SCHREUTELKAMP ROBERT, POON TZE, FOAD MAJEED

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