Phase continuity and inversion in polymer blends and simultaneous interpenetrating networks von Jordhamo, G. M., Manson, J. A., Sperling, L. H.

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Device and method for electric/mechanical connection structure von G. M. JORDHAMO, L. H. WIRTZ

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Polymers Containing Etch Resistant Ether Protecting Groups for DUV Lithography von Varanasi, P. Rao, Lawson, M.C., Jordhamo, G.

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Novel Classes of Cyclic Olefin Polymers for 193nm Lithography von Varanasi, P. Rao, Allen, R.D., Ito, H., Wallow, T, Truong, H., Chen, R., Lawson, P., Li, W., Brunsvold, B., Jordhamo, G., Kwong, R., Kajita, T., Nishimura, Y., Slezak, M., Peterson, W., Koshiba, M.

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IBM 193nm Semiconductor Resist: Material Properties, Resist Characteristics and Lithographic Performance von Varanasi, P. Rao, Mewherter, A. M., Lawson, M. C., Jordhamo, G., Allen, R., Opitz, J., Ito, H., Wallow, T., Hofer, D.

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IBM 193nm Semiconductor Resist von Rao Varanasi, P, M. Mewherter, A, C. Lawson, M, Jordhamo, G, Allen, R, Opitz, J, Ito, H, Wallow, T, Hofer, D

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High resolution photoresist compositions von RUTTER EDWARD W, CHEN JUNG-KUANG R, HEUMANN ROBERT G, LAWSON MARGARET C, MEWHERTER ANN MARIE, JORDHAMO GEORGE M, HUGHES TIMOTHY M, BARCLAY GEORGE G, MOREAU WAYNE M

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METHOD FOR PREPARING PHOTORESIST COMPOSITION von CHEN JUNG-KUANG R, HEUMANN ROBERG G, MEWHERTER ANN MARIE, JORDHAMO GEORGE M, BARCLAY GEORGE G, MOREAU WAYNE M, RUTTER EDWARD W JR, TIMOTHY M HUGHES, MARGARET C LAWSON

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High resolution photoresist compositions von MEWHERTER, ANN MARIE, LAWSON, MARGARET C, HUGHES, TIOMOTHY M, MOREAU, WAYNE M, RUTTER, EDWARD W., JR, HEUMANN, ROBERG G, CHEN, JUNG-KUANG R, BARCLAY, GEORGE G, JORDHAMO, GEORGE M

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High resolution photoresist compositions von CHEN JUNG-KUANG R, RUTTER EDWARD W. JR, HUGHES TIOMOTHY M, HEUMANN ROBERG G, LAWSON MARGARET C, MEWHERTER ANN MARIE, JORDHAMO GEORGE M, BARCLAY GEORGE G, MOREAU WAYNE M

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