Metalorganic chemical vapor deposition of very thin Pb(Zr,Ti)O3 thin films at low temperatures for high-density ferroelectric memory applications von Kim, Hye Ryoung, Jeong, Seehwa, Jeon, Chung Bae, Kwon, Oh Seong, Hwang, Cheol Seong, Han, Young Ki, Yang, Doo Young, Oh, Ki Young

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Metalorganic chemical vapor deposition of very thin Pb(Zr,Ti)O 3 thin films at low temperatures for high-density ferroelectric memory applications von Kim, Hye Ryoung, Jeong, Seehwa, Jeon, Chung Bae, Kwon, Oh Seong, Hwang, Cheol Seong, Han, Young Ki, Yang, Doo Young, Oh, Ki Young

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MOCVD of PZT thin films with different precursor solutions for testing mass-production compatibility von JEONG, Seehwa, SHI-ZHAO, Jin, HA, Jowoong, HYE RYOUNG KIM, PARK, Dong-Yeon, CHEOL SEONG HWANG, YOUNG KI HAN, CHEOL HOON YANG, KI YOUNG OH, KIM, Seung-Hyun, LEE, Dong-Soo

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Oxidation Behavior of TiAlN Barrier Layers with and without Thin Metal Overlayers for Memory Capacitor Applications von Song, Jaewon, Kim, Hye Ryeong, Park, Jaehoo, Jeong, Seehwa, Hwang, Cheol Seong

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