Benzethonium chloride as a tungsten corrosion inhibitor in neutral and alkaline media for the post-chemical mechanical planarization application von Punathil Meethal, Ranjith, Jalalzai, Palwasha, Muskan, Kumar, Sumit, Peter, Jerome, Klipp, Andreas, Kim, Tae-Gon, Park, Jin-Goo

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Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers von Poddar, Maneesh Kumar, Jalalzai, Palwasha, Sahir, Samrina, Yerriboina, Nagendra Prasad, Kim, Tae-Gon, Park, Jin-Goo

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Effect of slurry particles on PVA brush contamination during post-CMP cleaning von Sahir, Samrina, Cho, Hwi-Won, Jalalzai, Palwasha, Samanta, Suprakash, Hamada, Satomi, Kim, Tae-Gon, Park, Jin-Goo

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Effect of Slurry Additives on Co-BTA Complex Stability and Inhibition Property During Co CMP Process von Jalalzai, Palwasha, Ryu, Heon-Yul, Sahir, Samrina, Meethal, Ranjith Punathil, Hamada, Satomi, Kim, Tae-Gon, Park, Jin-Goo

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Sodium Phosphate Post-treatment on Al Coating: Morphological and Corrosion Study von Jeong, Hwa-Rang, Lee, Han-Seung, Jalalzai, Palwasha, Kwon, Seung-Jun, Singh, Jitendra Kumar, Hussain, Raja Rizwan, Alyousef, Rayed, Alabduljabbar, Hisham, Aslam, Fahid

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Effect of Skin Layer on Brush Loading, Cross-Contamination, and Cleaning Performance during Post-CMP Cleaning von Sahir, Samrina, Cho, Hwi-Won, Jalalzai, Palwasha, Peter, Jerome, Singh, Randeep, Hamada, Satomi, Kim, Tae-Gon, Park, Jin-Goo

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Effect of Dissolved Oxygen on Removal of Benzotriazole from Co during a Post-Co CMP Cleaning von Ryu, Heon Yul, Park, Jin Goo, Jalalzai, Palwasha, Kim, Tae Gon, Hamada, Satomi, Yerriboina, Nagendra Prasad

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