A 64-point Fourier transform chip for high-speed wireless LAN application using OFDM von Maharatna, K., Grass, E., Jagdhold, U.

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Low-Power VLSI Implementation of the Inner Receiver for OFDM-Based WLAN Systems von Troya, A., Maharatna, K., Krstic, M., Grass, E., Jagdhold, U., Kraemer, R.

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Efficient Inner Receiver Design for OFDM-Based WLAN Systems: Algorithm and Architecture von Troya, A., Maharatna, K., Krstic, M., Grass, E., Jagdhold, U., Kraemer, R.

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On the single-chip implementation of a Hiperlan/2 and IEEE 802.11a capable modem von Grass, E., Tittelbach-Helmrich, K., Jagdhold, U., Troya, A., Lippert, G., Kruger, O., Lehmann, J., Maharatna, K., Dombrowski, K.F., Fiebig, N., Kraemer, R., Mahonen, P.

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Electron beam lithography over topography von Bauch, L., Jagdhold, U., Böttcher, M.

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Antimony implantation into Si-B doping superlattices—damage and enhanced diffusion von Krüger, D., Jagdhold, U., Kurps, R., Zeindl, H. P.

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Passivation effects in novolak based resists during O2-RIE von Jagdhold, U., Pelka, J.

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Influence of interdiffusion and surfactants on Si/SiGe heterointerfaces von Zeindl, H.P., Nilsson, S., Jagdhold, U., Klatt, J., Kurps, R., Krüger, D., Bugiel, E.

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Strain measurement in thin pseudomorphic SiGe layers of submicron wires using Raman spectroscopy von Dietrich, B., Bugiel, E., Frankenfeldt, H., Harker, A.H., Jagdhold, U., Tillack, B., Wolff, A.

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Resist process to join electron beam lithography and photolithography von Bauch, L., Bo¨ttcher, M., Jagdhold, U.

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Differential ECL/CML Synthesis for SiGe BiCMOS von Gustat, H., Jagdhold, U., Winkler, F., Appel, M., Kell, G.

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Dry etching pattern transfer of 0.3 μm structures in technological layers using transmission phase masks von Bauch, L., Wolff, A., Jagdhold, U., Skaloud, T., Bauer, J.

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A novel 64-point FF/IFFT processor for IEEE 802.11(a) standard von Maharatna, K., Grass, E., Jagdhold, U.

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Submicrometer photolithography by surface imaging - experiment and simulation von Bauch, L., Jagdhold, U., Bauer, J., Dietrich, B., Höppner, W., Erzgräber, H., Dreger, H., Heller, G., Richter, K., Roll, E., Mehliβ, G., Abraham, W.

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A single SiGe chip fractional-N 275 MHz - 20 GHz PLL with integrated 20 GHz VCO von Follmann, R., Kother, D., Kohl, T., Engels, M., Podrebersek, T., Heyer, V., Schmalz, K., Herzel, F., Winkler, W., Osmany, S., Jagdhold, U.

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Passivation effects in novolak based resists during O 2-RIE von Jagdhold, U., Pelka, J.

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X-ray in situ observation of relaxation and diffusion processes in Si1− x Ge x layers on silicon substrates von Zaumseil, P., Jagdhold, U., Krüger, D.

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Point Defect Concentrations, Distributions and Diffusivity in Thin Si MBE-Films: Experiments and Simulations Based on Profiling of Implanted Multiple Delta Doping Structures von Krüger, D., Zeindl, H.P., Jagdhold, U., Kurps, R.

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A low phase noise integrated SiGe 18..20 GHz fractional-N synthesizer von Follmann, R., Kother, D., Engels, M., Heyer, V., Schmalz, K., Herzel, F., Winkler, W., Osmany, S., Jagdhold, U.

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Implementation of an IEEE 802.11a compliant low-power baseband processor von Krstic, M., Maharatna, K., Troya, A., Grass, E., Jagdhold, U.

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