High speed imaging of Z-pinch gas discharge in extreme ultraviolet and model-based three-dimensional reconstruction of emitting volume von Melsheimer, F., Ranis, M., Grützmacher, D., Juschkin, L.

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Structural properties of templated Ge quantum dot arrays: impact of growth and pre-pattern parameters von Tempeler, J, Danylyuk, S, Brose, S, Loosen, P, Juschkin, L

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Ptychographic imaging with a compact gas-discharge plasma extreme ultraviolet light source von Odstrcil, M, Bussmann, J, Rudolf, D, Bresenitz, R, Miao, Jianwei, Brocklesby, W S, Juschkin, L

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A phase retrieval algorithm based on three-dimensionally translated diffraction patterns von Loetgering, L., Hammoud, R., Juschkin, L., Wilhein, T.

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Optical properties of 2D fractional Talbot patterns under coherent EUV illumination von Kim, H, Li, W, Danylyuk, S, Brocklesby, W S, Marconi, M C, Juschkin, L

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Analysis of buried interfaces in multilayer mirrors using grazing incidence extreme ultraviolet reflectometry near resonance edges von Sertsu, M G, Nardello, M, Giglia, A, Corso, A J, Maurizio, C, Juschkin, L, Nicolosi, P

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Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography von Brose, S., Danylyuk, S., Juschkin, L., Dittberner, C., Bergmann, K., Moers, J., Panaitov, G., Trellenkamp, St, Loosen, P., Grützmacher, D.

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Laser triggered Z-pinch broadband extreme ultraviolet source for metrology von Tobin, I., Juschkin, L., Sidelnikov, Y., O’Reilly, F., Sheridan, P., Sokell, E., Lunney, J. G.

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Spectral Sharpening Algorithm for a Polychromatic Reflectometer in the Extreme Ultraviolet von Banyay, M., Juschkin, L.

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EUV Dark-Field Microscopy for Defect Inspection von Juschkin, L., Maryasov, A., Herbert, S., Aretz, A., Bergmann, K., Lebert, R.

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Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm von Bergmann, K., Danylyuk, S. V., Juschkin, L.

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Extreme ultraviolet free-standing transmittance filters for high brilliance sources, based on Nb/Zr and Zr/Nb thin films on Si3N4 membranes: Design, fabrication, optical and struct... von Jimenez, K., Nicolosi, P., Juschkin, L., Ahmed, Nadeem, Gaballah, A.E.H., Cattaruzza, E., Sertsu, M.G., Gerardino, A., Giglia, A., Mussler, G., Zuppella, P.

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EUV emission from Kr and Xe capillary discharge plasmas von Juschkin, L, Chuvatin, A, Zakharov, S V, Ellwi, S, Kunze, H-J

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X-ray lasing as a result of an induced instability in an ablative capillary discharge von Ellwi, S S, Juschkin, L, Ferri, S, Kunze, H-J, Koshelev, K N, Louis, E

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Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography von Krücken, Thomas, Bergmann, Klaus, Juschkin, Larissa, Lebert, Rainer

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Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths von Sertsu, M. G., Giglia, A., Brose, S., Park, D., Wang, Z. S., Mayer, J., Juschkin, L., Nicolosi, P.

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A capillary discharge as a pseudo-Planck radiator in the vacuum ultraviolet von Juschkin, L, Hildebrand, A, Kunze, H-J

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Pinch Plasma Radiation Sources for the Extreme Ultraviolet von Neff, W., Bergmann, K., Rosier, O., Lebert, R., Juschkin, L.

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Quantum Efficiency Determination of a Novel CMOS Design for Fast Imaging Applications in the Extreme Ultraviolet von Herbert, Stefan, Banyay, M., Maryasov, A. P., Hochschulz, F., Paschen, U., Vogt, H., Juschkin, L.

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Investigation of Dense Argon Plasmas in a Simple Capillary Discharge von Hildebrand, A., Juschkin, L., Kröger, M.

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