Integrated Carbon Cleaning and Oxide Cleaning on Si and SiGe in a Single Process Module von Wang, Fei, Jotheeswaran, Bubesh Babu, Tolle, John, Demos, Alex

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Carbon Removal and Native Oxide Cleaning on Si and SiGe Surfaces in Previum Chamber von Jotheeswaran, Bubesh, Tolle, John, Wang, Fei, Lin, Xing, Demos, Alex, Gao, Pei Pei

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PYROMETER CONTROLLED MULTI-WAFER CLEANING PROCESS von Jotheeswaran, Bubesh Babu, Demos, Alexandros, Suarez, Ernesto, Kajbafvala, Amir, Miskin, Caleb

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APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDUCTOR FILMS IN A SINGLE PROCESSING CHAMBER von Lin, Xing, Jotheeswaran, Bubesh Babu, Wang, Fei, Gao, Peipei, Tolle, John, Hill, Eric, Ramanathan, Vish

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Semiconductor processing preclean methods and apparatus von Lin, Xing, Jotheeswaran, Bubesh Babu, Wang, Fei, Fu, Yen Chun, Walimbe, Aditya, Sun, Xiaoda, Jin, Qu, Wei, Chuang, Kulkarni, Prahlad, Shin, Woo Jung, Chaudhury, Aditya, Kosireddy, Rajeev Reddy, Azimi, Amin

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SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS von Lin, Xing, Jotheeswaran, Bubesh Babu, Wang, Fei, Fu, Yen Chun, Walimbe, Aditya, Sun, Xiaoda, Jin, Qu, Wei, Chuang, Kulkarni, Prahlad, Shin, Woo Jung, Chaudhury, Aditya, Kosireddy, Rajeev Reddy, Azimi, Amin

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APPARATUS FOR USE WITH HYDROGEN RADICALS AND METHOD OF USING SAME von Lin, Xing, Jotheeswaran, Bubesh Babu, Wang, Wentao, Wang, Fei, Gao, Peipei, Wei, Chuang

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Method and system for depositing epitaxial material layer von DEMOS, ALEXANDROS, MISKIN, CALEB, SUAREZ, ERNESTO, JOTHEESWARAN, BUBESH BABU, KAJBAFVALA, AMIR

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APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDUCTOR FILMS IN A SINGLE PROCESSING CHAMBER von GAO PEIPEI, WANG FEI, TOLLE JOHN, HILL ERIC, JOTHEESWARAN BUBESH BABU, LIN XING, RAMANATHAN VISH

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APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDUCTOR FILMS IN A SINGLE PROCESSING CHAMBER von Lin, Xing, Jotheeswaran, Bubesh Babu, Wang, Fei, Gao, Peipei, Tolle, John, Hill, Eric, Ramanathan, Vish

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PYROMETER CONTROLLED MULTI-WAFER CLEANING PROCESS von KAJBAFVALA AMIR, DEMOS ALEXANDROS, MISKIN CALEB, JOTHEESWARAN BUBESH BABU, SUAREZ ERNESTO

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Apparatus for use with hydrogen radicals and method of using same von LIN, XING, GAO, PEIPEI, WANG, FEI, WANG, WENTAO, JOTHEESWARAN, BUBESH BABU, WEI, CHUANG

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APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDUCTOR FILMS IN SINGLE PROCESSING CHAMBER von GAO PEIPEI, WANG FEI, BUBESH BABU JOTHEESWARAN, JOHN TOLLE, LIN XING, VISH RAMANATHAN, ERIC HILL

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Apparatus and method for removal of oxide and carbon from semiconductor films in a single processing chamber von LIN, XING, TOLLE, JOHN, GAO, PEIPEI, WANG, FEI, HILL, ERIC, JOTHEESWARAN, BUBESH BABU, RAMANATHAN, VISH

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Semiconductor processing system, method for precleaning substrate, semiconductor processing anhydrous hydrogen fluoride delivery system, semiconductor processing water vapor delive... von KOSIREDDY, RAJEEV REDDY, WANG, FEI, SUN, XIAO-DA, SHIN, WOO-JUNG, JIN, QU, JOTHEESWARAN, BUBESH BABU, CHAUDHURY, ADITYA, LIN, XING, WALIMBE, ADITYA, AZIMI, AMIN, WEI, CHUANG, FU, YENUN, KULKARNI, PRAHLAD

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Apparatus for use with hydrogen radicals and method of using same von WANG, WEN-TAO, LIN, XING, GAO, PEI-PEI, WANG, FEI, JOTHEESWARAN, BUBESH BABU, WEI, CHUANG

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Semiconductor Processing Preclean Methods and Apparatus von CHAUDHURY ADITYA, WANG FEI, FU YEN CHUN, WALIMBE ADITYA, KULKARNI PRAHLAD, SHIN WOOJUNG, AZIMI AMIN, SUN XIAODA, JIN QU, WEI CHUANG, KOSIREDDY RAJEEV REDDY, JOTHEESWARAN BUBESH BABU, LIN XING

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DEVICE FOR USING HYDROGEN RADICAL AND APPLICATION METHOD THEREFOR von WANG WENTAO, GAO PEIPEI, WANG FEI, BUBESH BABU JOTHEESWARAN, WEI CHANG, LIN XING

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APPARATUS FOR USE WITH HYDROGEN RADICALS AND METHOD OF USING SAME von WANG WENTAO, GAO PEIPEI, WANG FEI, WEI CHUANG, JOTHEESWARAN BUBESH BABU, LIN XING

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APPARATUS FOR USE WITH HYDROGEN RADICALS AND METHOD OF USING SAME von WANG WENTAO, GAO PEIPEI, WANG FEI, WEI CHUANG, JOTHEESWARAN BUBESH BABU, LIN XING

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