Treffer 1 - 10 von 10 für Suche 'JEONGGYEOM', Suchdauer: 0,46s Treffer weiter einschränken
  1. 1
    Forming method of ceramic nanopowder thin film by using suspension plasma spray coating and Nano ceramic thin film formed the method

    Forming method of ceramic nanopowder thin film by using suspension plasma spray coating and Nano ceramic thin film formed the method von JEONGGYEOM, BANG CHAN UK

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  2. 2
    Post-treatment method of aluminum alloys in oxalic acid anodizing and Aluminum alloys manufactured by this method

    Post-treatment method of aluminum alloys in oxalic acid anodizing and Aluminum alloys manufactured by this method von PARK JI HYUN, JEONGGYEOM, JEON YOON NAM, JANG, GWAN SUB, KIM SANG JUN

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  3. 3
    Anodizing treatment method according to change of current density in oxalic acid and aluminum alloys anodized by this method

    Anodizing treatment method according to change of current density in oxalic acid and aluminum alloys anodized by this method von PARK JI HYUN, JEONGGYEOM, JEON YOON NAM, JANG, GWAN SUB, KIM SANG JUN

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  4. 4
    Sealing agent for aluminum alloys anodized with sulfuric acid and Sealing method of aluminum alloys using the same

    Sealing agent for aluminum alloys anodized with sulfuric acid and Sealing method of aluminum alloys using the same von PARK JI HYUN, JEONGGYEOM, JEON YOON NAM, JANG, GWAN SUB, KIM SANG JUN

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  5. 5
    Composition of Anodized Coating Electrolyte for Aluminum Alloy and its Composite Method

    Composition of Anodized Coating Electrolyte for Aluminum Alloy and its Composite Method von PARK JI HYUN, JEONGGYEOM, JEON YOON NAM, JANG, GWAN SUB, KIM SANG JUN

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  6. 6
    Surface hardening method using post heat treatment of aluminum alloy oxide layer

    Surface hardening method using post heat treatment of aluminum alloy oxide layer von PARK JI HYUN, JEONGGYEOM, JEON YOON NAM, JANG, GWAN SUB, KIM SANG JUN

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  7. 7
    Method of preparing the process chamber for Semiconductor Deposition Process And process chamber prepared by the same

    Method of preparing the process chamber for Semiconductor Deposition Process And process chamber prepared by the same von JEONGGYEOM, JANG GI BUM, JANG, GWAN SUB, KIM HUN SIK

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  8. 8
    Electrolytic solution for uniform anodic oxide film formation of titanium base material and manufacturing method of titanium base material using this same

    Electrolytic solution for uniform anodic oxide film formation of titanium base material and manufacturing method of titanium base material using this same von JEONGGYEOM, JANG GI BUM, JANG, GWAN SUB, KIM HUN SIK

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  9. 9
    Aluminum Vacuum Chamber for Chemical Vapor Deposition for Flat Display with Welding

    Aluminum Vacuum Chamber for Chemical Vapor Deposition for Flat Display with Welding von JEONGGYEOM, JANG GI BUM, JANG, GWAN SUB, KIM HUN SIK

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  10. 10
    Method of Manufacturing Aluminum Vacuum Chamber of Chemical Vapor Deposition for Flat Display with Welding

    Method of Manufacturing Aluminum Vacuum Chamber of Chemical Vapor Deposition for Flat Display with Welding von JEONGGYEOM, JANG GI BUM, JANG, GWAN SUB, KIM HUN SIK

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