Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methanol vapor von Gil, Hong Seong, Kim, Doo San, Jang, Yun Jong, Kim, Dea Whan, Kwon, Hea In, Kim, Gyoung Chan, Kim, Dong Woo, Yeom, Geun Young

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Plasma functional polymerization of dopamine using atmospheric pressure plasma and a dopamine solution mist von Mun, Mu Kyeom, Jang, Yun Jong, Kim, Ju Eun, Yeom, Geun Young, Kim, Dong Woo

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Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow von Gill, You Jung, Kim, Doo San, Gil, Hong Seong, Kim, Ki Hyun, Jang, Yun Jong, Kim, Ye Eun, Yeom, Geun Young

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Reactive ion etching of an ovonic threshold switch (OTS) material using hydrogen-based plasmas for non-volatile phase change memories von Kim, Doo San, Kim, Ju Eun, Gill, You Jung, Park, Jin Woo, Jang, Yun Jong, Kim, Ye Eun, Choi, Hyejin, Kwon, Oik, Yeom, Geun Young

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Atomic layer etching of Sn by surface modification with H and Cl radicals von Kim, Doo San, Jang, Yun Jong, Kim, Ye Eun, Gil, Hong Seong, Jeong, Byeong Hwa, Yeom, Geun Young

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Plasma atomic layer etching of ruthenium by oxygen adsorption-removal cyclic process von Kim, Doo San, Kwon, Hae In, Jang, Yun Jong, Kim, Gyoung Chan, Gil, Hong Seong, Kim, Dae Whan, Jeong, Byeong Hwa, Yeom, Geun Young

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Effect of Cl 2 Radical on Dry Development of Spin-Coated Metal Oxide Resist von Namgoong, Soo, Kim, Hee Ju, Kang, Yeo Kyung, Kim, Min Cheol, Jang, Yun Jong, Tak, Hyunwoo, Kang, Ji Eun, Lee, Sun Jin, Kim, Myung-Gil, Kim, Dongwoo, Yeom, Geun Young

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Effect of Cl2 Radical on Dry Development of Spin-Coated Metal Oxide Resist von Namgoong, Soo, Kim, Hee Ju, Kang, Yeo Kyung, Kim, Min Cheol, Jang, Yun Jong, Tak, Hyunwoo, Kang, Ji Eun, Lee, Sun Jin, Kim, Myung-Gil, Kim, Dongwoo, Yeom, Geun Young

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Direct nanoparticle coating using atmospheric plasma jet von Mun, Mu Kyeom, Jang, Yun Jong, Kim, Dong Woo, Yeom, Geun Young

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Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam von Kim, Ye Eun, Kim, Doo San, Jang, Yun Jong, Gil, Hong Seong, Jeon, Ho Seop, Hong, Jong Woo, Kim, In Ho, Kim, Cheol, Park, Jeong-Heon, Yeom, Geun Young

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Radical flux control in reactive ion beam etching (RIBE) by dual exhaust system von Kim, Doo San, Jang, Yun Jong, Kim, Ye Eun, Gil, Hong Seong, Kim, Hee Ju, Ji, You Jin, Kim, Hyung Yong, Kim, In Ho, Chae, Myoung Kwan, Park, Jong Chul, Yeom, Geun Young

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Etch characteristics of magnetic tunnel junction materials using H 2 /NH 3 reactive ion beam von Kim, Ju Eun, Kim, Doo San, Gill, You Jung, Jang, Yun Jong, Kim, Ye Eun, Cho, Hanna, Won, Bok-Yeon, Kwon, Oik, Yoon, Kukhan, Choi, Jin-Young, Park, Jea-Gun, Yeom, Geun Young

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Cyclic etching of silicon oxide using NF 3 /H 2 remote plasma and NH 3 gas flow von Gill, You Jung, Kim, Doo San, Gil, Hong Seong, Kim, Ki Hyun, Jang, Yun Jong, Kim, Ye Eun, Yeom, Geun Young

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Characteristics of blood flow resistance under transverse vibration: red blood cell suspension in Dextran-40 von Shin, Sehyun, Ku, Yunhee, Suh, Jang-Soo, Moon, Su-Yeon, Jang, Jong-Yun

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Etch characteristics of magnetic tunnel junction materials using H2/NH3 reactive ion beam von Kim, Ju Eun, Kim, Doo San, Gill, You Jung, Jang, Yun Jong, Kim, Ye Eun, Cho, Hanna, Won, Bok-Yeon, Kwon, Oik, Yoon, Kukhan, Choi, Jin-Young, Park, Jea-Gun, Yeom, Geun Young

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Selective isotropic etching of SiO 2 over Si 3 N 4 using NF 3 /H 2 remote plasma and methanol vapor von Gil, Hong Seong, Kim, Doo San, Jang, Yun Jong, Kim, Dea Whan, Kwon, Hea In, Kim, Gyoung Chan, Kim, Dong Woo, Yeom, Geun Young

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Study on Hydrogen-Based Reactive Ion Etching of Ovonic Threshold Switch (OTS) Materials for Phase Change Memory Devices von Kim, Doo San, Gill, You Jung, Jang, Yun Jong, Kim, Ye Eun, Yeom, Geun Young

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Plasma functional polymerization of dopamine using atmospheric pressure plasma and a dopamine solution mistElectronic supplementary information (ESI) available. See DOI: 10.1039/c8... von Mun, Mu Kyeom, Jang, Yun Jong, Kim, Ju Eun, Yeom, Geun Young, Kim, Dong Woo

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Analysis of design parameters for shunt valve and anti-siphon device used to treat patients with hydrocephalus von Jang, Jong Yun, Suh, Chang Min, Lee, Chong Sun

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Selective Isotropic Dry Etching of SiO2 Using F/H-Based Pulsed Remote Plasma and a Vapor Phase Solvent von Lee, Ji Yeon, Kim, Dae Whan, Gil, Hong Seong, Kim, Doo San, Jang, Yun Jong, Kim, Dong Woo, Lee, Jiyeon

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