Stabilization of fluorine-containing low-k dielectrics in a metal/insulator wiring structure by ultraviolet irradiation von COHEN STEPHEN ALAN, CALLEQARI ALESSANDRO, BABICH KATHERINA, JAHNES CHRISTOPHR VINCENT, SAENGER KATHERINE LYNN, PATEL VISHNUBHAI VITTHALBHAI, GRILL ALFRED, PURUSHOTHAMAN SAMPATH

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