Influence of defects on electron emission from diamond films von Show, Yoshiyuki, Matsuoka, Fumihiko, Hayashi, Masaharu, Ito, Hirokazu, Iwase, Mitsuo, Izumi, Tomio

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Thermal characterization of CVD diamond film by photoacoustic method von Takabatake, Nobuya, Kobayashi, Takeshi, Sekine, Daisuke, Izumi, Tomio

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Structural changes in CVD diamond film by boron and nitrogen doping von Show, Yoshiyuki, Matsukawa, Toshikazu, Ito, Hirokazu, Iwase, Mitsuo, Izumi, Tomio

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Delamination of Si by high dose H-ion implantation through thin SiO 2 film (ESR characterization) von Sasaki, Shiho, Izumi, Tomio, Hara, Tohru

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Structural properties of silicon oxide films prepared by the RF substrate biased ECR plasma CVD method von KITAGAWA, M, HIRAO, T, OHMURA, T, IZUMI, T

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Hydrogen concentration and bond configurations in silicon nitride films prepared by ECR plasma CVD method von HIRAO, T, SETSUNE, K, KITAGAWA, M, KAMADA, T, WASA, K, TSUKAMOTO, K, IZUMI, T

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Influence of deposition conditions on the properties of silicon nitride films prepared by the ECR plasma CVD method von HIRAO, T, SETSUNE, K, KITAGAWA, M, KAMADA, T, WASA, K, IZUMI, T

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Properties of silicon oxynitride films prepared by ECR plasma CVD method von HIRAO, T, SETSUNE, K, KITAGAWA, M, KAMADA, T, OHMURA, T, WASA, K, IZUMI, T

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On the Air Foam Compound Foaming Properties of Lime Hydrolyzate of Keratin Protein von IZUMI, Tomio

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Resistance of Fire-fighting Air Foam to High Temperature Petroleum von IZUMI, Tomio

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Photoacoustic evaluation of defects and thermal conductivity in the surface layer of ion implanted semiconductors von Takabatake, Nobuya, Kobayashi, Takeshi, Show, Yoshiyuki, Izumi, Tomio

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Effects of defects introduced by nitrogen doping on electron emission from diamond films von Show, Yoshiyuki, Matsukawa, Toshikazu, Iwase, Mitsuo, Izumi, Tomio

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Relationship between Electron Emission from the Surface of CVD Diamond Films and Defects Density von AKIBA, Yukio, HIROSE, Yoichi, KUROSU, Tateki, IIDA, Masamori, SHOW, Yoshiyuki, IZUMI, Tomio

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Photoluminescence of undoped, N+-implanted and C+-implanted AlAs grown by molecular beam epitaxy von MAKITA, Y, KUDO, K, MOMURA, T, TAKEUCHI, Y, YOKOTA, M, MITSUHASHI, Y, KOBAYASHI, T, IZUMI, T, MATSUMORI, T

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Structural characterization of CVD diamond films using the ESR method von Show, Yoshiyuki, Iwase, Mitsuo, Izumi, Tomio

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Evaluation of Semiconductor Thin-Films through Thermal Conductivity by Photoacoustic Method von Takabatake, Nobuya, Kobayashi, Takeshi, Fujiya, Masaharu, Izumi, Tomio

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ESR characterization of the top Si layer of ion implanted SIMOX von Chowdhury, Ershad Ali, Seki, Toshihide, Izumi, Tomio, Tanaka, Hisao, Hara, Tohru

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A photoacoustic study of thermal conductivity annealing curves for a silicon substrate implanted with Si ions von Takabatake, Nobuya, Kobayashi, Takeshi, Show, Yoshiyuki, Izumi, Tomio

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Annealing behavior of defects introduced in SOI structure by arsenic ion implantation (ESR and PAS studies) von Suzuki, Akinori, Nakamura, Hideki, Izumi, Tomio, Onda, Takayuki, Hara, Tohru

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Improved Electron Emission from Defective Diamond Film Deposited by CVD Method von Ito, Hirokazu, Matsukawa, Toshikazu, Izumi, Tomio, Iwase, Mitsuo, Show, Yoshiyuki

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