Radiation thermometry of silicon wafers based on emissivity-invariant condition von Iuchi, Tohru, Seo, Tomohiro

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Simultaneous measurement of emissivity and temperature of silicon wafers using a polarization technique von Iuchi, Tohru, Gogami, Atsushi

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Non-contact temperature measurement of silicon wafers based on the combined use of transmittance and radiance von Toyoda, Yuki, Seo, Tomohiro, Iuchi, Tohru

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Uncertainty of a hybrid surface temperature sensor for silicon wafers and comparison with an embedded thermocouple von Iuchi, Tohru, Gogami, Atsushi

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Uncertainty of a hybrid surface temperature sensor for silicon wafersand comparison with an embedded thermocouple von Iuchi, Tohru, Gogami, Atsushi

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My Serenditipities von IUCHI, Tohru

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Hybrid-type temperature sensor for in situ measurement von Iuchi, Tohru, Hiraka, Kensuke

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Emissivity modeling of metals during the growth of oxide film and comparison of the model with experimental results von Iuchi, Tohru, Furukawa, Tohru, Wada, Shigenobu

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Some considerations for a method that simultaneously measures the temperature and emissivity of a metal in a high temperature furnace von Iuchi, Tohru, Furukawa, Tohru

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Modeling of Emissivities of Metals and their Behaviors during the Growth of an Oxide Film von Iuchi, Tohru

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《第3回》たまたまが重なって von 井内, 徹

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New radiation thermometer for near room temperature von IUCHI, T, JONO, A

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In Situ Temperature Measurement of Silicon Semiconductor Wafers von IUCHI, Tohru

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New Deep-Level Photoluminescence Bands of Homoepitaxial CdTe Films Grown by Metalorganic Chemical Vapor Deposition von Fujii, Satoshi, Terada, Toshiuki, Fujita, Yasuhisa, Iuchi, Tohru

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Composition control in Hg1-xCdxTe growth by photoassisted MOCVD using an excimer laser von TERADA, T, FUJITA, Y, FUJII, S, IUCHI, T

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Simultaneous Measurement of Emissivity and Temperature for Glossy Metals near Room Temperature von Iuchi, Tohru, Wada, Shigenobu

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Radiation Pyrometry of a Steel Sheet in a High Temperature Furnace von FURUKAWA, Tohru, SATO, Nobuharu, IUCHI, Tohru

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Radiation Thermometry of Glossy Metals Near Room Temperature Using Polarized Radiances von IUCHI, Tohru, ISHII, Hirotaka

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Development of an Emissivity Measurement System and Its Application von FURUKAWA, Tohru, IUCHI, Tohru

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A Method for Simultaneous Measurement of Temperature and Emissivity, and Its Application to Steel Processing von IUCHI, Tohru

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