Resolution limit for optical lithography using polarized light illumination von ASAI, S, HANYU, I, TAKIKAWA, M

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Post-exposure-bake simulation model with constant acid loss of chemically amplified resist von YANAGISHITA, Y, MIYATA, S, KAIMOTO, Y, OIKAWA, A, YANO, E, HANYU, I

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Coherency dependence of projection printing method using a phase-shifting mask von ASAI, S, HANYU, I, HIKOSAKA, K

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MASCOT : Mask pattern correction tool using genetic algorithm von HARUKI, T, ASAI, S, NAKAGAWA, K, HANYU, I

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Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist von Takechi, Satoshi, Takahashi, Makoto, Kotachi, Akiko, Nozaki, Koji, Yano, Ei, Hanyu, Isamu

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A NOVEL POLYMER FOR A 193-nm RESIST von NOZAKI, KOJI, WATANABE, KEIJI, YANO, EI, KOTACHI, AKIKO, TAKECHI, SATOSHI, HANYU, ISAMU

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Simple Method of Correcting Optical Proximity Effect for 0.35 µm Logic LSI Circuits von Kawamura, Eiichi, Haruki, Tamae, Manabe, Yasuo, Isamu Hanyu, Isamu Hanyu

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Si-Containing Positive Resist for ArF Excimer Laser Lithography von KOTACHI, AKIKO, TAKECHI, SATOSHI, HANYU, ISAMU, LIMITED, FUJITSU

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SHADE CURTAIN von HANYU ISAMU

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Effect of Substrate Treatments on Resist Footing in Chemically Amplified System von Kaimoto, Yuko, Otoguro, Akihiko, Oikawa, Akira, Tago, Kazuki, Usujima, Akihiro, Hanyu, Isamu

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Modeling thermal effects for simulation of post exposure baking (PEB) process in positive photoresist von ASAI, S, HANYU, I, NUNOKAWA, M, ABE, M

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Simple method of correcting optical proximity effect for 0.35 μm logic LSI circuits von KAWAMURA, E, HARUKI, T, MANABE, Y, HANYU, I

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New effects of modified illumination in optical lithography von Asai, S., Hanyu, I., Takikawa, M.

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Recent advances in ultrahigh-speed HEMT LSI technology von ABE, M, MIMURA, T, KOBAYASHI, N, SUZUKI, M, KOSUGI, M, NAKAYAMA, M, ODANI, K, HANYU, I

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A Josephson Latch-Decoder von Hanyu, Isamu, Suzuki, Hideo, Hasuo, Shinya, Yamaoka, Toyoshi

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Chemically amplified resist material and process for the formation of resist patterns von HANYU, ISAMU, TAKECHI, SATOSHI

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Test photomask, flare evaluation method, and flare compensation method von HANYU, ISAMU, KIRIKOSHI, KATSUYOSHI, YAO, TERUYOSHI

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Chemically amplified resist material and process for the formation of resist patterns von TAKECHI SATOSHI, HANYU ISAMU

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Photomask and method of fabricating the same von HANYU, ISAMU, ASAI, SATORU

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Test photomask, flare evaluation method, and flare compensation method von YAO TERUYOSHI, KIRIKOSHI KATSUYOSHI, HANYU ISAMU

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