TCAD augmented generative adversarial network for hot-spot detection and mask-layout optimization in a large area HARC etching process von Kwon, Hyoungcheol, Huh, Hyunsuk, Seo, Hwiwon, Han, Songhee, Won, Imhee, Sue, Jiwoong, Oh, Dongyean, Iza, Felipe, Lee, Seungchul, Park, Sung Kye, Cha, Seonyong

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Asynchronous pulse-modulated plasma effect on the generation of abnormal high-energetic electrons for the suppression of charge-up induced tilting and cell density-dependent etchin... von Kwon, Hyoungcheol, Iza, Felipe, Won, Imhee, Lee, Minkyung, Han, Songhee, Park, Raseong, Kim, Yongjin, Oh, Dongyean, Park, Sung-Kye, Cha, Seonyong

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Effect of heavy inert ion strikes on cell density-dependent profile variation and distortion during the etching process for high-aspect ratio features von Kwon, Hyoungcheol, Won, Imhee, Han, Songhee, Yu, Dong-Hun, Kwon, Deuk-Chul, Im, Yeon Ho, Iza, Felipe, Oh, Dongyean, Park, Sung-Kye, Cha, Seonyong

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Asynchronous pulse-modulated plasma effect on the generation of abnormal high-energetic electrons for the suppression of charge-up induced tilting and cell density-dependent etchin... von Hyoungcheol Kwon, Felipe Iza, Imhee Won, Minkyung Lee, Songhee Han, Raseong Park, Yongjin Kim, Dongyean Oh, Sung-Kye Park, Seonyong Cha

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Effect of heavy inert ion strikes on cell density-dependent profile variation and distortion during the etching process for high-aspect ratio features von Hyoungcheol Kwon, Imhee Won, Songhee Han, Dong-Hun Yu, Deuk-Chul Kwon, Yeon Ho Im, Felipe Iza, Dongyean Oh, Sung-Kye Park, Seonyong Cha

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TCAD augmented generative adversarial network for hot-spot detection and mask-layout optimization in a large area HARC etching process von Hyoungcheol Kwon, Hyunsuk Huh, Hwiwon Seo, Songhee Han, Imhee Won, Jiwoong Sue, Dongyean Oh, Felipe Iza, Seungchul Lee, Sung Kye Park, Seonyong Cha

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