Real-time optical studies in the UV range of the annealing of zirconium-oxide thin films in vacuum von Cheon, Hyuknyeong, An, Ilsin

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Application of imaging ellipsometry to the detection of latent fingermarks von An, Ilsin

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Polarization errors associated with reflective objectives in a micro-spot spectroscopic ellipsometer von Park, Sungmo, An, Ilsin

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Rotating-compensator multichannel ellipsometry: Applications for real time Stokes vector spectroscopy of thin film growth von Lee, Joungchel, Rovira, P. I., An, Ilsin, Collins, R. W.

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Multichannel mueller matrix ellipsometry for simultaneous real-time measurement of bulk isotropic and surface anisotropic complex dielectric functions of semiconductors von Chen, Chi, An, Ilsin, Collins, R W

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Comparison imaging ellipsometry and its application to crystallization of indium oxide thin films von Park, Sungmo, Lee, Jungtae, Kim, Hyunjin, Kim, Jaekyun, Kim, Suenne, An, Ilsin

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Morphological Development and Etching of Gold Thin Film under UV-exposure in Chlorine-based Liquids von An, Ilsin, Seong, Deokkyeong

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Regulation of Interfacial Anchoring Orientation of Anisotropic Nanodumbbells von Jang, Hyunwoo, Song, Chaeyeon, Kim, Byungsoo, Lee, Chunghyeong, Lee, Juncheol, Han, Youngkyu, An, Ilsin, Kim, Joon Heon, Nam, Jin, Choi, Myung Chul

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Conduction mechanism of leakage current due to the traps in ZrO2 thin film von Seo, Yohan, Lee, Sangyouk, An, Ilsin, Song, Chulgi, Jeong, Heejun

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Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometer von An, Ilsin, Zapien, J.A., Chen, Chi, Ferlauto, A.S., Lawrence, A.S., Collins, R.W.

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Impact of the Parameters for a Chemically-amplified Resist on theLine-edge-roughness by Using a Molecular-scale LithographySimulation von Kim, Sang-Kon, Oh, Hye-Keun, Jung, Young-Dae, An, Ilsin

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Modeling of the Cross-linking and the Diffusion Processes in aNegative Chemically Amplified Resist von Kim, Sang-Kon, Oh, Hye-Keun, Jung, Young-Dae, An, Ilsin

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Impact of Polarization Inside a Resist for ArF Immersion Lithography von Kim, Sang-Kon, Oh, Hye-Keun, Jung, Young-Dae, An, Ilsin

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Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography von Jung, Mi-Rim, Kwak, Eun-A, An, Ilsin, Oh, Hye-Keun

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Chromeless Phase Lithography Using Scattering Bars and Zebra Patterns von Kang, Hye-Young, An, Ilsin, Shin, Dong-Soo, Jeong, HeeJun, Ahn, Chang-Nam, Oh, Hye-Keun

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Comparison null imaging ellipsometry using polarization rotator von Park, Sungmo, Kim, Eunsung, Kim, Jiwon, An, Ilsin

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Monitoring photodeposition of polymer films from diacetylene monomer solutions using in situ real-time spectroscopic ellipsometry von Hui, Du, Kim, Jin-Sook, Kim, Yeon-Taik, An, Ilsin, Paley, Mark S

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A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry von An, Ilsin, Lee, Jaeho, Bang, Kyoung-Yoon, Kim, Ok-Kyung, Oh, Hye-Keun

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Characterization of Free-Standing Nano-Membranes by Using Ellipsometry von Park, Sungmo, Lee, Changho, An, Ilsin, Kim, Min-Su, Park, Jin-Goo, Ahn, Jin-ho

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Rotating-compensator multichannel ellipsometry for characterization of the evolution of nonuniformities in diamond thin-film growth von Lee, Joungchel, Rovira, P. I., An, Ilsin, Collins, R. W.

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