Literature review of the vehicle relocation problem in one-way car sharing networks von Illgen, Stefan, Höck, Michael

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Electric vehicles in car sharing networks – Challenges and simulation model analysis von Illgen, Stefan, Höck, Michael

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Establishing car sharing services in rural areas: a simulation-based fleet operations analysis von Illgen, Stefan, Höck, Michael

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Mechanical, microstructural and in-situ neutron diffraction investigations of equi-biaxial Bauschinger effects in an interstitial-free DC06 steel von Härtel, Markus, Illgen, Christian, Panzner, Tobias, Bruder, Enrico, Schmaltz, Stefan, Van Petegem, Steven, Willner, Kai, Durst, Karsten, van Swygenhoven, Helena, Wagner, Martin F.-X.

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Understanding Strain-Induced Drive-Current Enhancement in Strained-Silicon n-MOSFET and p-MOSFET von Flachowsky, Stefan, Wei, Andy, Illgen, Ralf, Herrmann, Tom, Höntschel, Jan, Horstmann, Manfred, Klix, Wilfried, Stenzel, Roland

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Effect of source/drain-extension dopant species on device performance of embedded SiGe strained p -metal oxide semiconductor field effect transistors using millisecond annealing von Illgen, Ralf, Flachowsky, Stefan, Herrmann, Tom, Klix, Wilfried, Stenzel, Roland, Feudel, Thomas, Höntschel, Jan, Horstmann, Manfred

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Since 2015 the SinoGerman research project SIGN supports water quality improvement in the Taihu region, China von Schmidt, Kathrin Rachel, der Beek, Tim aus, Dai, Xiaohu, Dong, Bingzhi, Dopp, Elke, Eichinger, Florian, Hammers-Wirtz, Monika, Haußmann, Regina, Holbach, Andreas, Hollert, Henner, Illgen, Marc, Jiang, Xia, Koehler, Jan, Koester, Stephan, Korth, Andreas, Kueppers, Stephan, Li, Aili, Lohmann, Matthias, Moldaenke, Christian, Norra, Stefan, Qin, Boqiang, Qin, Yanwen, Reese, Moritz, Riehle, Edmund, Santiago-Schuebel, Beatrix, Schaefer, Charlotte, Simon, Anne, Song, Yonghui, Staaks, Christian, Steinhardt, Joerg, Subklew, Guenter, Tao, Tao, Wu, Tingfeng, Yin, Daqiang, Zhao, Fangfang, Zheng, Binghui, Zhou, Meiyue, Zou, Hua, Zuo, Jiane, Tiehm, Andreas

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Detailed simulation study of embedded SiGe and Si:C source/drain stressors in nanoscaled silicon on insulator metal oxide semiconductor field effect transistors von Flachowsky, Stefan, Illgen, Ralf, Herrmann, Tom, Klix, Wilfried, Stenzel, Roland, Ostermay, Ina, Naumann, Andreas, Wei, Andy, Höntschel, Jan, Horstmann, Manfred

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Simulation of asymmetric doped high performance silicon on insulator metal oxide semiconductor field effect transistors for very large scale integrated complementary metal oxide se... von Herrmann, Tom, Flachowsky, Stefan, Illgen, Ralf, Klix, Wilfried, Stenzel, Roland, Höntschel, Jan, Feudel, Thomas, Horstmann, Manfred

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Semiconductor-on-insulator wafer, semiconductor structure including a transistor, and methods for the formation and operation thereof von Flachowsky, Stefan, Illgen, Ralf

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Process Oriented Software Quality Assurance - An Experience Report in Process Improvement - OEM Perspective von Illgen, Thomas, Ortmann, Stefan

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Semiconductor structure including a first transistor and a second transistor von Flachowsky Stefan, Illgen Ralf

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SEMICONDUCTOR-ON-INSULATOR WAFER, SEMICONDUCTOR STRUCTURE INCLUDING A TRANSISTOR, AND METHODS FOR THE FORMATION AND OPERATION THEREOF von Flachowsky Stefan, Illgen Ralf

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SEMICONDUCTOR DEVICE AND METHOD von Flachowsky Stefan, Illgen Ralf

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SEMICONDUCTOR STRUCTURE INCLUDING A FIRST TRANSISTOR AND A SECOND TRANSISTOR von Flachowsky Stefan, Illgen Ralf

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Method including a formation of a transistor and semiconductor structure including a first transistor and a second transistor von Flachowsky Stefan, Illgen Ralf

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METHOD INCLUDING A FORMATION OF A TRANSISTOR AND SEMICONDUCTOR STRUCTURE INCLUDING A FIRST TRANSISTOR AND A SECOND TRANSISTOR von Flachowsky Stefan, Illgen Ralf

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ULTRATHIN BODY FULLY DEPLETED SILICON-ON-INSULATOR INTEGRATED CIRCUITS AND METHODS FOR FABRICATING SAME von ILLGEN RALF, FLACHOWSKY STEFAN

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Ultrathin body fully depleted silicon-on-insulator integrated circuits and methods for fabricating same von ILLGEN RALF, FLACHOWSKY STEFAN

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In situ doping and diffusionless annealing of embedded stressor regions in PMOS and NMOS devices von ILLGEN RALF, FLACHOWSKY STEFAN

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