Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20 nm MOSFET device demonstrators von Kretz, J., Dreeskornfeld, L., Ilicali, G., Lutz, T., Weber, W.

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Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20nm MOSFET device demonstrators von Kretz, J., Dreeskornfeld, L., Ilicali, G., Lutz, T., Weber, W.

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Electron beam lithography for nanometer-scale planar double-gate transistors von Weber, W., Ilicali, G., Kretz, J., Dreeskornfeld, L., Rösner, W., Hansch, W., Risch, L.

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Planar double gate transistors with asymmetric independent gates von Ilicali, G., Weber, W., Rosner, W., Dreeskornfeld, L., Hartwich, J., Kretz, J., Lutz, T., Mazellier, J.-P., Stadele, M., Specht, M., Luyken, J.R., Landgraf, E., Hofmann, F., Risch, L., Kasmaier, R., Hansch, W.

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Use of LPCVD TEOS as a direct bonding material for layer transfer: densified vs. undensified von Ilicali, G., Rosner, W., Weber, W., Boz, S., Dreeskornfeld, L., Hartwich, J., Kretz, J., Luyken, J.R., Landgraf, E., Hofmann, F., Risch, L., Hansch, W.

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Reduction of layout variations with stress-compensated hybrid STI fills: a comprehensive analysis von Stadele, M., Ilicali, G., Landgraf, E., Goldbach, M., Finsterbusch, S., Lindolf, J., Radecker, J., Uhlig, B.

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Maternal representations during pregnancy and early motherhood von Ilicali, Ebru Taskin, Fisek, Guler Okman

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An Investigation of the Isothermal Confined Double Concentric Jet System von GÜRÜZ, KEMAL, ILICALI, COSKAN

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