The effects of deposition rate on the structural and electrical properties of ZnO:Al films deposited on (1120) oriented sapphire substrates von IGASAKI, Y, SAITO, H

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Substrate temperature dependence of electrical properties of ZnO:Al epitaxial films on sapphire (1210) von IGASAKI, Y, SAITO, H

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Argon gas pressure dependence of the properties of transparent conducting ZnO:Al films deposited on glass substrates von Igasaki, Yasuhiro, Kanma, Hirokazu

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The effects of zinc diffusion on the electrical and optical properties of ZnO:Al films prepared by r.f. reactive sputtering von Igasaki, Yasuhiro, Saito, Hiromi

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Epitaxial growth of aluminum-doped zinc oxide films on (11–.0) oriented sapphire substrates von Igasaki, Yasuhiro

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Some properties of Al-doped ZnO transparent conducting films prepared by RF reactive sputtering von Igasaki, Yasuhiro, Ishikawa, Michiaki, Shimaoka, Goro

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The effects of substrate bias on the structural and electrical properties of TiN films prepared by reactive r.f. sputtering von Igasaki, Yasuhiro, Mitsuhashi, Hiroji

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The effects of deposition conditions on the structural properties of ZnO sputtered films on sapphire substrates von Igasaki, Yasuhiro, Naito, Takashi, Murakami, Kenji, Tomoda, Waichi

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Origin of negative temperature coefficient of resistivity in polycrystalline Ti-N films von IGASAKI, Y, MITSUHASHI, H

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Argon gas pressure dependence of the properties of transparent conducting ZnO :Al films deposited on glass substrates von IGASAKI, Yasuhiro, KANMA, Hirokazu

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The preparation of highly oriented InSe films by electrodeposition von Igasaki, Yasuhiro, Fujiwara, Takeshi

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Structure and Electrical Properties of Titanium Nitride Films von Igasaki, Yasuhiro, Mitsuhashi, Hiroji, Azuma, Koichi, Muto, Tokio

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The effects of pulsing the current in galvanostatic electrodeposition technique on the composition and surface morphology of InSe films von Fujiwara, Takeshi, Igasaki, Yasuhiro

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Electrical Properties of Ti–Fe Films von Kurita, Noriaki, Igasaki, Yasuhiro, Mitsuhashi, Hiroji

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The Effects of Substrate Temperature on the Properties of ZnO : Al Thin Films Prepared by RF Magnetron Sputtering von IGASAKI, Yasuhiro

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Structure of Ti–Fe Alloy Films Prepared by Composite-Cathode Sputtering von Kurita, Noriaki, Igasaki, Yasuhiro, Nakamura, Yasuo, Shimaoka, Goro, Mitsuhashi, Hiroji

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Properties of InN Films Prepared by Magnetron Sputtering von SAITO, Nobuo, IGASAKI, Yasuhiro

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Effects of IIIa Elements on Properties of Sputterd ZnO Films von INO, Chikanori, NAITO, Takashi, IGASAKI, Yasuhiro

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Preparation of CuInSe 2 films by hot-wall evaporation technique von Igasaki, Yasuhiro, Maeda, Mitsuaki, Harada, Masahiro, Fujiwara, Takeshi

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Preparation of CuInSe2 films by hot-wall evaporation technique von IGASAKI, Y, MAEDA, M, HARADA, M, FUJIWARA, T

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