Continuous microcarrier-based cell culture in a benchtop microfluidic bioreactor von Abeille, F, Mittler, F, Obeid, P, Huet, M, Kermarrec, F, Dolega, M E, Navarro, F, Pouteau, P, Icard, B, Gidrol, X, Agache, V, Picollet-D'hahan, N

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5 kV multielectron beam lithography: MAPPER tool and resist process characterization von Rio, D., Constancias, C., Martin, M., Icard, B., van Nieuwstadt, J., Vijverberg, J., Pain, L.

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Resist outgassing assessment for multi electron beams lithography von Mebiene-Engohang, A.-P., Michallon, P., Tiron, R., Fontaine, H., Icard, B., Bensahel, D., Pain, L., Boussey, J.

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32 nm node BEOL integration with an extreme low- k porous SiOCH dielectric k = 2.3 von Hamioud, K., Arnal, V., Farcy, A., Jousseaume, V., Zenasni, A., Icard, B., Pradelles, J., Manakli, S., Brun, Ph, Imbert, G., Jayet, C., Assous, M., Maitrejean, S., Galpin, D., Monget, C., Guillan, J., Chhun, S., Richard, E., Barbier, D., Haond, M.

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C80-J THORACIC ONCOLOGY CASE REPORTS IV: Hickam's Dictum: A Tale Of Metachronous Pulmonary Adenocarcinoma, Carcinoid Tumor And Histoplasmosis von Icard, B L, Biscardi, F H, Umar, S

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Transitioning of direct e-beam write technology from research and development into production flow von Pain, L., Icard, B., Manakli, S., Todeschini, J., Minghetti, B., Wang, V., Henry, D.

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A103 CASE REPORTS: SARCOIDOSIS, ASTHMA, MALIGNANCIES AND DRUG-INDUCED LUNG INJURY: Pine Oil Inhalation: Pneumonitis Secondary To Inhalant Abuse Of A Household Cleaner von Campbell, S, Icard, B, Loschner, A L

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D46 CASE REPORTS: TRACHEAL TUMORS AND OTHER MYSTERIES: Primary Tracheal Lymphoma: A Regression Of A Rare Malignancy von Icard, B L, Campbell, S, Loschner, A L

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Study on line edge roughness for electron beam acceleration voltages from 50 to 5 kV von Rio, D., Constancias, C., Saied, M., Icard, B., Pain, L.

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Continuous microcarrier-based cell culture in a benchtop microfluidic bioreactorElectronic supplementary information (ESI): Supplementary Table, Fig. S1 and S2. See DOI: 10.1039/c4... von Abeille, F, Mittler, F, Obeid, P, Huet, M, Kermarrec, F, Dolega, M. E, Navarro, F, Pouteau, P, Icard, B, Gidrol, X, Agache, V, Picollet-D'hahan, N

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Holed MEM Resonators for High Accuracy Frequency Trimming von Civet, Y., Casset, F., Carpentier, J.F., Icard, B., Bustos, J., Leverd, F., Mercier, D., Basrour, S.

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32nm node BEOL integration with an extreme low-k porous SiOCH dielectric k=2.3 von Hamioud, K., Arnal, V., Farcy, A., Jousseaume, V., Zenasni, A., Icard, B., Pradelles, J., Manakli, S., Brun, Ph, Imbert, G., Jayet, C., Assous, M., Maitrejean, S., Galpin, D., Monget, C., Guillan, J., Chhun, S., Richard, E., Barbier, D., Haond, M.

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Skinned polymeric membranes. Approach to the mechanism of formation of surface holes von Addad, J. P. Cohen, Icard, B., Pellicioli, L.

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Study on line edge roughness for electron beam acceleration voltages from 50to5kV von Rio, D., Constancias, C., Saied, M., Icard, B., Pain, L.

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Holed MEM resonators with high aspect ratio, for high accuracy frequency trimming von Civet, Y., Basrour, S., Casset, F., Icard, B., Mercier, D., Carpentier, J.-F, Bustos, J., Leverd, F.

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New Electron Beam Proximity Effects Correction Approach for 45 and 32 nm Nodes von Manakli, S., Docherty, K., Pain, L., Todeschini, J., Jurdit, M., Icard, B., Chomat, M., Minghetti, B.

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A solution for an ideal planar multi-gates process for ultimate CMOS? von Monfray, S, Huguenin, J, Martin, M, Samson, M, Borowiak, C, Arvet, C, Dalemcourt, J, Perreau, P, Barnola, S, Bidal, G, Denorme, S, Campidelli, Y, Benotmane, K, Leverd, F, Gouraud, P, Le-Gratiet, B, De-Buttet, C, Pinzelli, L, Beneyton, R, Morel, T, Wacquez, R, Bustos, J, Icard, B, Pain, L, Barraud, S, Ernst, T, Boeuf, F, Faynot, O, Skotnicki, T

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Meditations and confessions for a retreat of ten days von Duquesne, Armand B. d'Icard. [from old catalog]

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0.248/spl mu/m/sup 2/ and 0.334/spl mu/m/sup 2/ conventional bulk 6T-SRAM bit-cells for 45nm node low cost - general purpose applications von Boeuf, F., Arnaud, F., Boccaccio, C., Salvetti, F., Todeschini, J., Pain, L., Jurdit, M., Manakli, S., Icard, B., Planes, N., Gierczynski, N., Denorme, S., Borot, B., Ortolland, C., Duriez, B., Tavel, B., Gouraud, P., Broekaart, M., Dejonghe, V., Brun, P., Guyader, F., Morini, P., Reddy, C., Aminpur, M., Laviron, C., Smith, S., Jacquemin, J.P., Mellier, M., Andre, F., Bicais-Lepinay, N., Jullian, S., Bustos, J., Skotnicki, T.

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New electron beam proximity effects correction (EBPC) approach for 45nm and 32nm nodes von Manakli, S., Docherty, K., Pain, L., Todeschini, J., Jurdit, M., Icard, B., Leseuil, S., Minghetti, B.

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