OES diagnostics as a universal technique to control the Si etching structures profile in ICP von Osipov, Artem A., Iankevich, Gleb A., Speshilova, Anastasia B., Gagaeva, Alina E., Osipov, Armenak A., Enns, Yakov B., Kazakin, Alexey N., Endiiarova, Ekaterina V., Belyanov, Ilya A., Ivanov, Viktor I., Alexandrov, Sergey E.

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Registration of an ICP Plasma CV Dependences under Various Pressures in the Plasma-Chemical Deep Etching System von Iankevich, Gleb A.

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High-temperature etching of SiC in SF6/O2 inductively coupled plasma von Osipov, Artem A., Iankevich, Gleb A., Speshilova, Anastasia B., Osipov, Armenak A., Endiiarova, Ekaterina V., Berezenko, Vladimir I., Tyurikova, Irina A., Tyurikov, Kirill S., Alexandrov, Sergey E.

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Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching von Osipov, Artem A., Iankevich, Gleb A., Alexandrov, Sergey E.

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Deep Etching of LiNbO3 Using Inductively Coupled Plasma in SF6-Based Gas Mixture von Osipov, Artem A., Osipov, Armenak A., Iankevich, Gleb A., Speshilova, Anastasiya B., Shakhmin, Alexander, Berezenko, Vladimir I., Alexandrov, Sergey E.

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Aerosol-Assisted Chemical Deposition of Nanocomposite Material in the "Iron-Carbon-Oxygen" System von Iankevich, Gleb A., Tyurikov, Kirill, Aleksandrov, Sergey E., Tyurikova, Irina

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The effect of a lithium niobate heating on the etching rate in SF6 ICP plasma von Osipov, Artem A, Alexandrov, Sergey E, Iankevich, Gleb A

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Deep Etching of LiNbO 3 Using Inductively Coupled Plasma in SF 6 -Based Gas Mixture von Osipov, Artem A., Osipov, Armenak A., Iankevich, Gleb A., Speshilova, Anastasiya B., Shakhmin, Alexander, Berezenko, Vladimir I., Alexandrov, Sergey E.

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Silicon carbide dry etching technique for pressure sensors design von Osipov, Artem A., Iankevich, Gleb A., Osipov, Armenak A., Speshilova, Anastasiya B., Karakchieva, Anna A., Endiiarova, Ekaterina V., Levina, Svetlana N., Karakchiev, Sergey V., Alexandrov, Sergey E.

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The effect of a lithium niobate heating on the etching rate in SF 6 ICP plasma von Osipov, Artem A, Alexandrov, Sergey E, Iankevich, Gleb A

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Influence of operation parameters on BOSCH-process technological characteristics von Osipov, Artem A., Iankevich, Gleb A., Berezenko, Vladimir I., Endiiarova, Ekaterina V.

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ICP etching of SiC with low surface roughness von Osipov, Artem A., Iankevich, Gleb A., Berezenko, Vladimir I., Speshilova, Anastasiya B., Alexandrov, Sergey E.

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High Entropy Approach to Engineer Strongly Correlated Functionalities in Manganites von Sarkar, Abhishek, Wang, Di, Kante, Mohana V., Eiselt, Luis, Trouillet, Vanessa, Iankevich, Gleb, Zhao, Zhibo, Bhattacharya, Subramshu S., Hahn, Horst, Kruk, Robert

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Fine structure tuning for strongly correlated functionalities in high entropy oxides von Wang, Di, Sarkar, Abhishek, Iankevich, Gleb, Zhao, Zhibo, Hahn, Horst, Kruk, Robert, Kuebel, Christian

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A New Class of Cluster–Matrix Nanocomposite Made of Fully Miscible Components von Iankevich, Gleb, Sarkar, Abhishek, Katnagallu, Shyam, Chellali, Mohammed Reda, Wang, Di, Velasco, Leonardo, Singh, Ruby, Reisinger, Thomas, Kruk, Robert, Hahn, Horst

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Artificial synapses based on Josephson junctions with Fe nanoclusters in the amorphous Ge barrier von Jué, Emilie, Iankevich, Gleb, Reisinger, Thomas, Hahn, Horst, Provenzano, Virgil, Pufall, Matthew R., Haygood, Ian W., Rippard, William H., Schneider, Michael L.

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Magnetotransport Properties of Ferromagnetic Nanoparticles in a Semiconductor Matrix Studied by Precise Size-Selective Cluster Ion Beam Deposition von Gack, Nicolas, Iankevich, Gleb, Benel, Cahit, Kruk, Robert, Wang, Di, Hahn, Horst, Reisinger, Thomas

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Corona discharge plasma application for the deposition of nanocomposite coatings von Tyurikov, Kirill, Alexandrov, Sergey, Iankevich, Gleb

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