Occurrence of blaNDM-1 in a Clinical Isolate of Acinetobacter lwoffii in Japan: Comparison of blaNDM-1-Harboring Plasmids between A. lwoffii and A. pittii Originated from a Hospita... von Hayashi, Wataru, Iimura, Masaki, Horiuchi, Kazuki, Arai, Eriko, Natori, Tatsuya, Suzuki, Shin, Matsumoto, Go, Izumi, Katsutoshi, Yoshida, Satoshi, Nagano, Yukiko, Nagano, Noriyuki

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Antimicrobial Resistance and Type III Secretion System Virulotypes of Pseudomonas aeruginosa Isolates from Dogs and Cats in Primary Veterinary Hospitals in Japan: Identification of... von Hayashi, Wataru, Izumi, Katsutoshi, Yoshida, Satoshi, Takizawa, Shino, Sakaguchi, Kanae, Iyori, Keita, Minoshima, Ken-Ichi, Takano, Shinya, Kitagawa, Maki, Nagano, Yukiko, Nagano, Noriyuki

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Genomic characterisation and epidemiology of nosocomial Serratia marcescens isolates resistant to ceftazidime and their plasmids mediating rare blaTEM-61 von Hayashi, Wataru, Yoshida, Satoshi, Izumi, Katsutoshi, Koide, Shota, Soga, Eiji, Takizawa, Shino, Arakawa, Yoshichika, Nagano, Yukiko, Nagano, Noriyuki

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History of SIMOX Material von Izumi, Katsutoshi

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High-Precision Analysis of Oxygen Depth Profile in [sup 16]O[sup +]-Implanted Silicon Substrates by Spectroscopic Ellipsometry von Iikawa, Hirofumi, Nakao, Motoi, Gruska, Bernd, Izumi, Katsutoshi

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Challenge to 200 mm 3C-SiC Wafers Using SOI von Izumi, Katsutoshi, Nakao, Motoi, Yokoyama, Takashi, Iikawa, Hirofumi, Kobayashi, Sumio

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Mechanical Property Characterization of Boron-Doped Silicon by Berkovich-Type Indenter von Guolin Yu, Guolin Yu, Junji Watanabe, Junji Watanabe, Katsutoshi Izumi, Katsutoshi Izumi, Kenshiro Nakashima, Kenshiro Nakashima, Takashi Jimbo, Takashi Jimbo, Masayoshi Umeno, Masayoshi Umeno

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Presence of Colistin- and Tigecycline-Resistant Klebsiella pneumoniae ST29 in Municipal Wastewater Influents in Japan von Hayashi, Wataru, Iimura, Masaki, Soga, Eiji, Koide, Shota, Izumi, Katsutoshi, Yoshida, Satoshi, Arakawa, Yoshichika, Nagano, Yukiko, Nagano, Noriyuki

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Simulation Method for Buried Oxide Formation of Separation by Implanted Oxygen Structure during Post-Implantation Thermal Annealing von Nakao, Motoi, Sudoh, Koichi, Iikawa, Hirofumi, Iwasaki, Hiroshi, Izumi, Katsutoshi

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WIND POWER GENERATOR AND RETRACTABLE STEP CONTROLLING METHOD von SUGINO JUNICHI, IZUMI KATSUTOSHI

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Occurrence of blaNDM-1 in a clinical isolate of Acinetobacter lwoffii in Japan: comparison of blaNDM-1-harboring plasmids between A. lwoffii and A. pittii originated from the hospi... von Hayashi, Wataru, Iimura, Masaki, Horiuchi, Kazuki, Arai, Eriko, Natori, Tatsuya, Suzuki, Shin, Matsumoto, Go, Izumi, Katsutoshi, Yoshida, Satoshi, Nagano, Yukiko, Nagano, Noriyuki

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Genomic characterisation and epidemiology of nosocomial Serratia marcescens isolates resistant to ceftazidime and their plasmids mediating rare bla TEM-61 von Hayashi, Wataru, Yoshida, Satoshi, Izumi, Katsutoshi, Koide, Shota, Soga, Eiji, Takizawa, Shino, Arakawa, Yoshichika, Nagano, Yukiko, Nagano, Noriyuki

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PROCESS FOR PRODUCING SINGLE CRYSTAL SIC SUBSTRATE AND SINGLE SRYSTAL SIC SUBSTRATE PRODUCED BY THE PROCESS von YOKOYAMA TAKASHI, IZUMI KATSUTOSHI

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PROCESS FOR PRODUCING SINGLE CRYSTAL SiC SUBSTRATE AND SINGLE CRYSTAL SiC SUBSTRATE PRODUCED BY THE PROCESS von IZUMI, KATSUTOSHI, YOKOYAMA, TAKASHI

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Transport properties of silicon nanostructures fabricated on SIMOX substrates von Murase, Katsumi, Takahashi, Yasuo, Nakajima, Yasuyuki, Namatsu, Hideo, Nagase, Masao, Kurihara, Kenji, Iwadate, Kazumi, Horiguchi, Seiji, Tabe, Michiharu, Izumi, Katsutoshi

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METHOD FOR MANUFACTURING NITROGEN COMPOUND SEMICONDUCTOR SUBSTRATE, NITROGEN COMPOUND SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SINGLE CRYSTAL SIC SUBSTRATE, AND SINGLE CRY... von KAWAMURA KEISUKE, ASAMURA HIDETOSHI, YOKOYAMA TAKASHI, IZUMI KATSUTOSHI

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Current Progress in SOI Wafer Technology von Izumi, Katsutoshi

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METHOD FOR MANUFACTURING NITROGEN COMPOUND SEMICONDUCTOR SUBSTRATE, NITROGEN COMPOUND SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SINGLE CRYSTAL SIC SUBSTRATE, AND SINGLE CRY... von KAWAMURA, KEISUKE, ASAMURA, HIDETOSHI, IZUMI, KATSUTOSHI, YOKOYAMA, TAKASHI

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High-precision analysis of oxygen depth profile in 16O+-implanted silicon substrates by spectroscopic ellipsometry von IIKAWA, Hirofumi, NAKAO, Motoi, GRUSKA, Bernd, IZUMI, Katsutoshi

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PROCESS FOR PRODUCING SINGLE CRYSTAL SiC SUBSTRATE von YOKOYAMA, Takashi, IZUMI, Katsutoshi

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