The transcriptional network that controls growth arrest and differentiation in a human myeloid leukemia cell line von Suzuki, Harukazu, Forrest, Alistair R R, van Nimwegen, Erik, Daub, Carsten O, Balwierz, Piotr J, Irvine, Katharine M, Lassmann, Timo, Ravasi, Timothy, Hasegawa, Yuki, de Hoon, Michiel J L, Katayama, Shintaro, Schroder, Kate, Carninci, Piero, Tomaru, Yasuhiro, Kanamori-Katayama, Mutsumi, Kubosaki, Atsutaka, Akalin, Altuna, Ando, Yoshinari, Arner, Erik, Asada, Maki, Asahara, Hiroshi, Bailey, Timothy, Bajic, Vladimir B, Bauer, Denis, Beckhouse, Anthony G, Bertin, Nicolas, Björkegren, Johan, Brombacher, Frank, Bulger, Erika, Chalk, Alistair M, Chiba, Joe, Cloonan, Nicole, Dawe, Adam, Dostie, Josee, Engström, Pär G, Essack, Magbubah, Faulkner, Geoffrey J, Fink, J Lynn, Fredman, David, Fujimori, Ko, Furuno, Masaaki, Gojobori, Takashi, Gough, Julian, Grimmond, Sean M, Gustafsson, Mika, Hashimoto, Megumi, Hashimoto, Takehiro, Hatakeyama, Mariko, Heinzel, Susanne, Hide, Winston, Hofmann, Oliver, Hörnquist, Michael, Huminiecki, Lukasz, Ikeo, Kazuho, Imamoto, Naoko, Inoue, Satoshi, Inoue, Yusuke, Ishihara, Ryoko, Iwayanagi, Takao, Jacobsen, Anders, Kaur, Mandeep, Kawaji, Hideya, Kerr, Markus C, Kimura, Ryuichiro, Kimura, Syuhei, Kimura, Yasumasa, Kitano, Hiroaki, Koga, Hisashi, Kojima, Toshio, Kondo, Shinji, Konno, Takeshi, Krogh, Anders, Kruger, Adele, Kumar, Ajit, Lenhard, Boris, Lennartsson, Andreas, Lindow, Morten, Lizio, Marina, Macpherson, Cameron, Maeda, Norihiro, Maher, Christopher A, Maqungo, Monique, Mar, Jessica, Matigian, Nicholas A, Matsuda, Hideo, Mattick, John S, Meier, Stuart, Miyamoto, Sei, Miyamoto-Sato, Etsuko, Nakabayashi, Kazuhiko, Nakachi, Yutaka, Nakano, Mika, Nygaard, Sanne, Okayama, Toshitsugu, Okazaki, Yasushi, Okuda-Yabukami, Haruka, Orlando, Valerio, Otomo, Jun, Pachkov, Mikhail, Petrovsky, Nikolai

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Acid formation and deprotection reaction by novel sulfonates in a chemical amplification positive photoresist von Schlegel, L, Ueno, T, Shiraishi, H, Hayashi, N, Iwayanagi, T

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Azide-phenolic resin photoresists for deep UV lithography von Iwayanagi, T., Kohashi, T., Nonogaki, S., Matsuzawa, T., Douta, K., Yanazawa, H.

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A negative resist for KrF excimer laser lithography von Toriumi, M., Hayashi, N., Hashimoto, M., Nonogaki, S., Ueno, T., Iwayanagi, T.

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Azide Photoresists for Deep U.V. Lithography von Iwayanagi, T., Kohashi, T., Nonogaki, S.

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Evaluating Protein Sequence Signatures Inferred from Protein-Protein Interaction Data by Gene Ontology Annotations von Maruyama, O., Hirakawa, H., Iwayanagi, T., Ishida, Y., Takeda, S., Otomo, J., Kuhara, S.

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Optimization of the composition of a new MRS-type negative resist von Matsuzawa, T., Kishimoto, A., Iwayanagi, T., Yanazawa, H., Obayashi, H.

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Photocarrier generation processes of phthalocyanines studied by photocurrent and electroabsorption measurements von Saito, Toshiro, Sisk, Wade, Kobayashi, Toshiyuki, Suzuki, Shigeo, Iwayanagi, Takao

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Third-order nonlinear optical properties of polymorphs of oxotitanium phthalocyanine von Nalwa, Hari Singh, Saito, Toshiro, Kakuta, Atsushi, Iwayanagi, Takao

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Determination of acid diffusion in chemical amplification positive deep-UV resists von SCHLEGEL, L, UENO, T, HAYASHI, N, IWAYANAGI, T

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TETRAHYDROPYRANYL PROTECTED POLYHYDROXYSTYRENE FOR A CHEMICALLY AMPLIFIED DEEP UV RESIST von HAYASHI, N, UENO, T, HESP, S, TORIUMI, M, IWAYANAGI, T

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Tetrahydropyranyl protected polyhydroxystyrene for a chemically amplified deep UV resist von Hayashi, N, Toriumi, M, Hesp, S, Ueno, T, Iwayanagi, T

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Thermochromism of Specific Crystal Form Oxotitanium Phthalocyanines Studied by Electroabsorption and X-ray Diffraction Measurements von Saito, Toshiro, Iwakabe, Yasushi, Kobayashi, Toshiyuki, Suzuki, Shigeo, Iwayanagi, Takao

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Dissolution inhibition of phenolic resins by diazonaphthoquinone : effect of polymer structure von HATTORI, T, UENO, T, SHIRAISHI, H, HAYASHI, N, IWAYANAGI, T

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Acid formation from various sulfonates in a chemical amplification positive resist von Ueno, Takumi, Schlegel, Leo, Hayashi, Nobuaki, Shiraishi, Hiroshi, Iwayanagi, Takao

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Peroxopolytungstic acids: a new inorganic resist material von OKAMOTO, H, IAWYANAGI, T, MOCHIJI, K, UMEZAKI, H, KUDO, T

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Photoresponsive polymers. VII: Reversible solubility change of polystyrene having pendant spirobenzopyran groups and its application to photoresists von IRIE, M, IWAYANAGI, T, TANIGUCHI, Y

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Resist materials utilizing oxygen plasma resistance of iodine compounds von UENO, T, SHIRAISHI, H, IWAYANAGI, T, NONOGAKI, S

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Thermochromism of specific crystal form oxotitanium phthalocyanines studied vy electroabsorption and X-ray diffraction measurements von SAITO, T, IWAKABE, Y, KOBAYASHI, T, SUZUKI, S, IWAYANAGI, T

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Negative resist for i-line lithography utilizing acid catalyzed silanol-condensation reaction von HAYASHI, N, TADANO, K, TANAKA, T, SHIRAISHI, H, UENO, T, IWAYANAGI, T

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