Feasibility Study on Direct Counting of Viruses and Bacteria by Using Microelectrode Array von Ishige, Yu, Goto, Yusuke, Yanagi, Itaru, Ishida, Takeshi, Itabashi, Naoshi, Kamahori, Masao

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Noninvasively measuring respiratory activity of rat primary hepatocyte spheroids by scanning electrochemical microscopy von Takahashi, Ryosuke, Zhou, Yuanshu, Horiguchi, Yoshiko, Shiku, Hitoshi, Sonoda, Hiroshi, Itabashi, Naoshi, Yamamoto, Jiro, Saito, Taku, Matsue, Tomokazu, Hisada, Akiko

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Prediction of etching results and etching stabilization by applying principal component regression to emission spectra during in-situ cleaning von Iwakoshi, Takehisa, Hirota, Kosa, Mori, Masahito, Tanaka, Jun'ichi, Itabashi, Naoshi

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Evolution of titanium residue on the walls of a plasma-etching reactor and its effect on the polysilicon etching rate von Hirota, Kosa, Itabashi, Naoshi, Tanaka, Junichi

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Physicians' emotional barriers toward epilepsy surgery von Nakasato, Nobukazu, Jin, Kazutaka, Iwasaki, Masaki, Itabashi, Naoshi, Tominaga, Teiji

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Platinum plasmonic nanostructure arrays for massively parallel single-molecule detection based on enhanced fluorescence measurements von Saito, Toshiro, Takahashi, Satoshi, Obara, Takayuki, Itabashi, Naoshi, Imai, Kazumichi

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Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing von Tatsumi, Tetsuya, Hayashi, Hisataka, Morishita, Satoshi, Noda, Shuichi, Okigawa, Mitsuru, Itabashi, Naoshi, Hikosaka, Yukinobu, Inoue, Masami

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Spatial distribution of SiH3 radicals in RF silane plasma von ITABASHI, N, NISHIWAKI, N, MAGANE, M, NAITO, S, GOTO, T, MATSUDA, A, YAMADA, C, HIROTA, E

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Diffusion coefficient and reaction rate constant of the SiH3 radical in silane plasma von ITABASHI, N, KATO, K, NISHIWAKI, N, GOTO, T, YAMADA, C, HIROTA, E

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Measurements of the CF radical in DC pulsed CF4/H2 discharge plasma using infrared diode laser absorption spectroscopy von MAGANE, M, ITABASHI, N, NISHIWAKI, N, GOTO, T, YAMADA, C, HIROTA, E

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A Model Analysis of Feature Profile Evolution and Microscopic Uniformity during Polysilicon Gate Etching in Cl 2 /O 2 Plasmas von Osano, Yugo, Mori, Masahito, Itabashi, Naoshi, Takahashi, Kazuo, Eriguchi, Koji, Ono, Kouichi

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Force curve measurement of DNA adsorption on silicon nitride surface in aqueous solution using DNA-immobilized probe with scanning probe microscopy von Akahori, Rena, Miwa, Takafumi, Itabashi, Naoshi, Yanagi, Itaru, Yokoi, Takahide, Takeda, Kenichi

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Measurement of the SiH3 radical density in silane plasma using infrared diode laser absorption spectroscopy von ITABASHI, N, KATO, K, NISHIWAKI, N, GOTO, T, YAMADA, C, HIROTA, E

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Monitoring of Electron Energy Distribution Change from Optical Emission for Nonmagnetic Ultrahigh-Frequency Plasma von Kinoshita, Keizo, Noda, Shuichi, Okigawa, Mitsuru, Hikosaka, Yukinobu, Itabashi, Naoshi, Inoue, Masami

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Positive charge generation at a SiO2/Si interface due to bombardment with metastable atoms von ONO, T, ITABASHI, N, OCHIAI, I, YAMAMOTO, S, MOCHIJI, K

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Photon-stimulated ion desorption from chlorine-adsorbed GaAs surfaces von Itabashi, Naoshi, Ochiai, Isao, Yamamoto, Seiji, Ono, Tetsuo, Mochiji, Kozo

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Desorption of Ga and As atoms from GaAs surface induced by slow multiply charged Ar ions von ITABASHI, N, MOCHIJI, K, SHIMIZU, H, OHTANI, S, KATO, Y, TANUMA, H, KOBAYASHI, N

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Photon-Stimulated Ion Desorption from Semiconductor Surfaces von Mochiji, Kozo, Ochiai, Isao, Ogawa, Tarou, Yamamoto, Seiji, Itabashi, Naoshi, Lee, Kaidee, Hanson, David M.

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Biopolymer analysis device, biopolymer analysis equipment, and biopolymer analysis method von Michiru Fujioka, Tatsuo Nakagawa, Yoshimitsu Yanagawa, Naoshi Itabashi, Yusuke Goto

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SiH3 radical density in pulsed silane plasma von ITABASHI, N, NISHIWAKI, N, MAGANE, M, GOTO, T, MATSUDA, A, YAMADA, C, HIROTA, E

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