PATTERNING CHARACTERISTICS OF A CHEMICALLY-AMPLIFIED NEGATIVE RESIST IN SYNCHROTRON RADIATION LITHOGRAPHY von DEGUCHI, K, MIYOSHI, K, ISHII, T, MATSUDA, T

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30-nm-Gate InP-Based Lattice-Matched High Electron Mobility Transistors with 350 GHz Cutoff Frequency von Tetsuya Suemitsu, Tetsuya Suemitsu, Tetsuyoshi Ishii, Tetsuyoshi Ishii, Haruki Yokoyama, Haruki Yokoyama, Takatomo Enoki, Takatomo Enoki, Yasunobu Ishii, Yasunobu Ishii, Toshiaki Tamamura, Toshiaki Tamamura

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Nanocomposite resist system von Ishii, Tetsuyoshi, Nozawa, Hiroshi, Tamamura, Toshiaki

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Contrast Enhancement of ZEP520 Resist by Fullerene-Derivative Incorporation von Ishii, Tetsuyoshi, Murata, Yuka, Shigehara, Kiyotaka

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Fullerene-Derivative Nanocomposite Resist for Nanometer Pattern Fabrication von Ishii, Tetsuyoshi, Tamamura, Toshiaki, Shigehara, Kiyotaka

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High-aspect-ratio nanometer-pattern fabrication using fullerene-incorporated nanocomposite resists for dry-etching application von SHIBATA, T, ISHII, T, NOZAWA, H, TAMAMURA, T

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Contrast enhancement of SAL resist by reducing residual solvent at prebake von ISHII, T, MATSUDA, T

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Fabrication of Nanometer-Order Dot Patterns by Lift-off Using a Fullerene-Incorporated Bilayer Resist System von Ishii, Tetsuyoshi, Tanaka, Hirotaka, Kuramochi, Eiichi, Tamamura, Toshiaki

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Direct fabrication of polyimide waveguide grating by synchrotron radiation von Kobayashi, Junya, Maruno, Tohru, Ishii, Tetsuyoshi, Tamamura, Toshiaki, Horiuchi, Toshiyuki

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SOLVENT DRIVER AND SOLVENT DRIVE MODULE von ISHII TETSUYOSHI

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30-nm two-step recess gate InP-Based InAlAs/InGaAs HEMTs von Suemitsu, T., Yokoyama, H., Ishii, T., Enoki, T., Meneghesso, G., Zanoni, E.

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High-Speed Wavelength-Tunable Optical Filter Using Cascaded Mach-Zehnder Interferometers With Apodized Sampled Gratings von Segawa, Toru, Matsuo, Shinji, Ishii, Tetsuyoshi, Ohiso, Yoshitaka, Shibata, Yasuo, Suzuki, Hiroyuki

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Refractive Index Control of Polyimide by Synchrotron Radiation, and the Application to Fabrication of a Waveguide Grating von Kobayashi, Junya, Ishii, Tetsuyoshi, Maruo, Yasuko, Tamamura, Toshiaki

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Short Cavity DBR Laser Using Vertical Groove Gratings for Large-Scale Photonic Integrated Circuits von Docter, B., Segawa, T., Kakitsuka, T., Matsuo, S., Ishii, T., Kawaguchi, Y., Kondo, Y., Suzuki, H., Karouta, F., Smit, M.K.

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A New Fabrication Technique for Fine Circular Patterns von Ishii, Tetsuyoshi, Matsuda, Tadahito

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Second- and third-order dispersion compensator using a high-resolution arrayed-waveguide grating von Tsuda, H., Okamoto, K., Ishii, T., Naganuma, K., Inoue, Y., Takenouchi, H., Kurokawa, T.

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Slow Tumbling Motion of Nitroxide Spin Probe/Labelled PMMA Studied Using Saturation Transfer ESR and Saturation Parameter Methods von Ohno, Keiichi, Ishii, Tetsuyoshi, Sohma, Junkichi

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Depletion- and enhancement-mode modulation-doped field-effect transistors for ultrahigh-speed applications: an electrochemical fabrication technology von Dong Xu, Suemitsu, T., Osaka, J., Umeda, Y., Yamane, Y., Ishii, Y., Ishii, T., Tamamura, T.

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SUBSTRATE FOR ELECTRONIC DEVICE, AND MANUFACTURING METHOD THEREOF von YAMAGUCHI TORU, ISHII TETSUYOSHI

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SUBSTRATE FOR ELECTRONIC DEVICE AND ITS MANUFACTURING METHOD von YAMAGUCHI TORU, ISHII TETSUYOSHI

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