Near-field lithography as prototype nano-fabrication tool von Inao, Yasuhisa, Nakasato, Shinji, Kuroda, Ryo, Ohtsu, Motoichi

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Molecular Design of o-Nitrobenzyl Phenol Ether for Photo-deprotection Resist; Challenge to half-pitch 22nm using Near-field Lithography von Ito, Toshiki, Terao, Akira, Inao, Yasuhisa, Yamaguchi, Takako, Mizutani, Natsuhiko

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Fabrication of sub-100nm Patterns using Near-field Mask Lithography with Ultra-thin Resist Process von Ito, Toshiki, Ogino, Masaya, Yamanaka, Tomohiro, Inao, Yasuhisa, Yamaguchi, Takako, Mizutani, Natsuhiko, Kuroda, Ryo

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OPHTHALMOLOGIC APPARATUS, OPHTHALMOLOGIC APPARATUS CONTROL METHOD, AND PROGRAM von INAO YASUHISA

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Fabrication of hp 32 nm resist patterns using near-field lithography von Yamaguchi, Takako, Yamada, Tomohiro, Terao, Akira, Ito, Toshiki, Inao, Yasuhisa, Mizutani, Natsuhiko, Kuroda, Ryo

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OPHTHALMIC IMAGING APPARATUS, CONTROL METHOD FOR OPHTHALMIC IMAGING APPARATUS, AND COMPUTER-READABLE MEDIUM von Inao, Yasuhisa, Sakagawa, Wataru

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Image processing apparatus and image processing method with generating motion contrast image using items of three-dimensional tomographic data von Ohta, Koichi, Inao, Yasuhisa

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Fabrication of half-pitch 32 nm resist patterns using near-fieldlithography with a - Si mask von Ito, Toshiki, Yamada, Tomohiro, Inao, Yasuhisa, Yamaguchi, Takako, Mizutani, Natsuhiko, Kuroda, Ryo

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Fabrication of half-pitch 32nm resist patterns using near-field lithography with a-Si mask von Ito, Toshiki, Yamada, Tomohiro, Inao, Yasuhisa, Yamaguchi, Takako, Mizutani, Natsuhiko, Kuroda, Ryo

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SURFACE EMITTING LASER AND OPTICAL COHERENCE TOMOGRAPHY APPARATUS von INAO YASUHISA

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SURFACE EMITTING LASER AND OPTICAL COHERENCE TOMOGRAPHY APPARATUS von INAO, YASUHISA

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OPHTHALMOLOGIC DEVICE, IMAGE PROCESSING DEVICE, ACTUATION METHOD OF OPHTHALMOLOGIC DEVICE, AND PROGRAM von INAO YASUHISA, SAKAGAWA WATARU

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Ophthalmic imaging apparatus von Sumiya, Toshiharu, Inao, Yasuhisa

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Molecular Design of o-Nitrobenzyl Phenol Ether for Photo-deprotection Resist; Challenge to half-pitch 22 nm using Near-field Lithography von Ito, Toshiki, Terao, Akira, Inao, Yasuhisa, Yamaguchi, Takako, Mizutani, Natsuhiko

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Fabrication of hp 32nm resist patterns using near-field lithography von Yamaguchi, Takako, Yamada, Tomohiro, Terao, Akira, Ito, Toshiki, Inao, Yasuhisa, Mizutani, Natsuhiko, Kuroda, Ryo

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IMAGE PROCESSING APPARATUS AND IMAGE PROCESSING METHOD von Ohta, Koichi, Inao, Yasuhisa

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SURFACE EMITTING LASER AND OPTICAL COHERENCE TOMOGRAPHY APPARATUS von INAO, YASUHISA

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OPTICAL COHERENCE TOMOGRAPHIC IMAGING APPARATUS, BLOOD FLOW RATE MEASUREMENT DEVICE, BLOOD FLOW RATE MEASUREMENT METHOD, AND PROGRAM von INAO YASUHISA

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OPHTHALMIC IMAGING APPARATUS von Sumiya Toshiharu, Inao Yasuhisa

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Fabrication of sub-100 nm Patterns using Near-field Mask Lithography with Ultra-thin Resist Process von Ito, Toshiki, Ogino, Masaya, Yamanaka, Tomohiro, Inao, Yasuhisa, Yamaguchi, Takako, Mizutani, Natsuhiko, Kuroda, Ryo

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