A two-dimensional computer simulation for dry etching using Monte Carlo techniques von IGNACIO ULACIA F, J, MCVITTIE, J. P

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Equipment modelling of CVD and etching von Ulacia F., J.Ignacio, Werner, Christoph

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Equipment simulation of selective tungsten deposition von WERNER, C, ULACIA, J. I, HOPFMANN, C, FLYNN, P

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Crystal-orientation dependent etch rates and a trench model for dry etching von ULACIA F, J. I, PETTI, C. J, MCVITTIE, J. P

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A 3-D fluid simulation of a dry-etching aluminium hexode reactor von Ulacia F, J.I.

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