Application and evaluation of nitriding treatment using active screen plasma von Ichimura, Susumu, Takashima, Seigo, Tsuru, Ippei, Ohkubo, Daichi, Matsuo, Hideaki, Goto, Mineo

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Direct Synthesis of Large-Area Graphene on Insulating Substrates at Low Temperature using Microwave Plasma CVD von Vishwakarma, Riteshkumar, Zhu, Rucheng, Abuelwafa, Amr Attia, Mabuchi, Yota, Adhikari, Sudip, Ichimura, Susumu, Soga, Tetsuo, Umeno, Masayoshi

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Synthesis of Thin Graphite Film by Microwave Surface-Wave Plasma Chemical Vapor Deposition von Ichimura, Susumu, Umeno, Masayoshi

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DC Biasing Effects on Properties of Carbon Nanowalls by Microwave Surface-Wave Plasma Chemical Vapor Deposition and Towards Transparent Electrode von Ichimura, Susumu, Hayashi, Yasuhiko, Umeno, Masayoshi

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Multilayer graphene/amorphous carbon hybrid films prepared by microwave surface‐wave plasma CVD: synthesis and characterization von Ichimura, Susumu, Hayashi, Yasuhiko, Umeno, Masayoshi

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Multilayer graphene/amorphous carbon hybrid films prepared by microwave surface-wave plasma CVD: synthesis and characterization: Multilayer graphene/amorphous carbon hybrid films von Ichimura, Susumu, Hayashi, Yasuhiko, Umeno, Masayoshi

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Effect of ultraviolet light irradiation and ion collision on the quality of multilayer graphene prepared by microwave surface-wave plasma chemical vapor deposition von Ichimura, Susumu, Hayashi, Yasuhiko, Umeno, Masayoshi

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Simultaneous improvement in electrical conductivity and Seebeck coefficient of PEDOT:PSS by N 2 pressure-induced nitric acid treatment von Zar Myint, May Thu, Hada, Masaki, Inoue, Hirotaka, Marui, Tatsuki, Nishikawa, Takeshi, Nishina, Yuta, Ichimura, Susumu, Umeno, Masayoshi, Ko Kyaw, Aung Ko, Hayashi, Yasuhiko

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Simultaneous improvement in electrical conductivity and Seebeck coefficient of PEDOT:PSS by N2 pressure-induced nitric acid treatment von May Thu Zar Myint, Hada, Masaki, Inoue, Hirotaka, Marui, Tatsuki, Nishikawa, Takeshi, Nishina, Yuta, Ichimura, Susumu, Umeno, Masayoshi, Aung Ko Ko Kyaw, Hayashi, Yasuhiko

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Influence of pressure of nitrogen gas on structure and thermoelectric properties of acid-treated PEDOT:PSS films von Myint, May Thu Zar, Inoue, Hirotaka, Ichimura, Susumu, Nishikawa, Takeshi, Nishina, Yuta, Kyaw, Aung Ko Ko, Hayashi, Yasuhiko

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Effect of CO2 and O3 treatment on directly Synthesized Graphene on Insulating Substrates at low temperature using Microwave Plasma Enhanced Chemical Vapor Deposition von Vishwakarma, Riteshkumar Ratneshkumar, Rucheng, Zhu, Abuelwafa, Amr, Ichimura, Susumu, Adhikari, Sudip, Umeno, Masayashi

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Simultaneous improvement in electrical conductivity and Seebeck coefficient of PEDOT:PSS by N2 pressure-induced nitric acid treatmentElectronic supplementary information (ESI) avai... von Zar Myint, May Thu, Hada, Masaki, Inoue, Hirotaka, Marui, Tatsuki, Nishikawa, Takeshi, Nishina, Yuta, Ichimura, Susumu, Umeno, Masayoshi, Ko Kyaw, Aung Ko, Hayashi, Yasuhiko

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Gas decomposition using atmospheric pressure plasma and its evaluation von Ichimura, Susumu, Takashima, Seigo, Yamaguchi, Yoshihisa, Yamada, Takayuki

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Nitriding treatment by Active Screen Plasma and its evaluation von Ichimura, Susumu, Tsuru, Ippei, Ohkubo, Daichi, Matsuo, Hideaki, Goto, Mineo

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Nitriding treatment by Active Screen Plasma and its evaluation von Ichimura, Susumu, Takashima, Seigo, Tsuru, Ippei, Ohkubo, Daichi, Matsuo, Hideaki, Goto, Mineo

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Nitriding treatment by Active Screen Plasma and its evaluation von Ichimura, Susumu, Takashima, Seigo, Tsuru, Ippei, Ohkubo, Daichi, Matsuo, Hideaki, Goto, Mineo

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Multilayer layer graphene synthesis by Microwave Surface Wave Plasma CVD, and high quality according to ultraviolet light shading von Ichimura, Susumu, Uchida, Hideo, Wakita, Koichi, Hayashi, Yasuhiko, Umeno, Masayoshi

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Graphene growth by microwave surface wave plasma CVD and method of removing excess carbon films von Ichimura, Susumu, Uchida, Hideo, Wakita, Koichi, Hayashi, Yasuhiko, Umeno, Masayoshi

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All carbon solarcell by microwave surface wave plasma CVD von Ghimire, Dilip Chandra, Adhikari, Sudip, Ichimura, Susumu, Uchida, Hideo, Wakita, Koichi, Umeno, Masayoshi

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METHOD FOR MANUFACTURING ELECTRONIC SUBSTRATE von ICHIMURA SUSUMU

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