Eco-friendly photolithography using water-developable pure silk fibroin von Park, Joonhan, Lee, Sung-Gyu, Marelli, Benedetto, Lee, Myungjae, Kim, Taehyung, Oh, Hye-Keun, Jeon, Heonsu, Omenetto, Fiorenzo G., Kim, Sunghwan

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Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation von Park, Juhae, Lee, Sung-Gyu, Vesters, Yannick, Severi, Joren, Kim, Myungwoong, De Simone, Danilo, Oh, Hye-Keun, Hur, Su-Mi

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Waveguide effect in high-NA EUV lithography: The key to extending EUV lithography to the 4-nm node von Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

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Critical dimension variation caused by wrinkle in extreme ultra-violet pellicle for 3-nm node von Kim, Guk-Jin, Kim, In-Seon, Lee, Sung-Gyu, Yeung, Michael, Kim, Min-Su, Park, Jin-Goo, Oh, Hye-Keun

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Imaging performance of mesh supported pellicle for extreme ultraviolet lithography von Ko, Ki-Ho, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

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Study of Temperature Behaviors for a Pellicle in Extreme-Ultraviolet Lithography: Mesh Structure von Kim, In-Seon, Kim, Ji-Won, Oh, Hye-Keun

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Coarse-Grained Modeling of EUV Patterning Process Reflecting Photochemical Reactions and Chain Conformations von Kim, Tae-Yi, Kang, In-Hwa, Park, Juhae, Kim, Myungwoong, Oh, Hye-Keun, Hur, Su-Mi

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Overlay and CD uniformity variation due to wafer thermal deformation caused by EUV exposure von Ko, Hee-Chang, Choi, Won-Young, Kim, Min-Woo, Kang, Ji-Won, Jeon, Ji-Hyun, You, Da-Kyung, Oh, Hye-Keun

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Thermal analysis of extreme ultraviolet pellicle with metallic coatings von Park, Eun-Sang, Kim, Min-Ha, Hwang, Sollee, Oh, Hye-Keun

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Optimal phase shift mask and multilayer stack with the evaluation of imaging performance and process latitude in extreme ultraviolet high numerical aperture von Kang, In-Hwa, Park, Jang-Gun, Ban, Chung-Hyun, Oh, Hye-Keun

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Thermomechanical stability evaluation of various pellicle structures with contaminant particles von Ban, Chung-Hyun, Kang, In-Hwa, Choi, Won-Young, Oh, Hye-Keun

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Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations von Kim, In-Seon, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

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Modeling of thermomechanical changes of extreme-ultraviolet mask and their dependence on absorber variation von Ban, Chung-Hyun, Park, Eun-Sang, Park, Jae-Hun, Oh, Hye-Keun

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Influence of a non-ideal sidewall angle of extreme ultra-violet mask absorber for 1×-nm patterning in isomorphic and anamorphic lithography von Ko, Ki-Ho, Moon, Yongseung, Jeong, Changyeong, Kim, Heebom, Jeon, Chan-Uk, Oh, Hye-Keun

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Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents von Kim, Min-Su, Purushothaman, Muthukrishnan, Kim, Hyun-Tae, Song, Hee-Jin, Kim, Young-Woong, Ahn, Jin-Ho, Oh, Hye-Keun, Park, Jin-Goo

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Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography von Park, Eun-Sang, Shamsi, Zahid Hussain, Kim, Ji-Won, Kim, Dai-Gyoung, Park, Jin-Goo, Ahn, Jin-Ho, Oh, Hye-Keun

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Optical Investigation of Deep Ultraviolet Degradation of Pellicles von Cheon, Hyuknyeong, Choi, Hyungseok, Oh, Hye-Keun, An, Ilsin

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Impact of the non-uniform intensity distribution caused by a meshed pellicle of extreme ultraviolet lithography von Ko, Ki-Ho, Park, Jin-Goo, Ahn, Jin-Ho, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

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Dimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL) von Hafeez, Hassan, Ryu, Heon-Yul, An, Il Sin, Oh, Hye-Keun, Ahn, Jin-Ho, Park, Jin-Goo

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A Mask Generation Approach to Double Patterning Technology with Inverse Lithography von Kim, Sang-Kon, Oh, Hye-Keun, Jung, Young-Dae, An, Ilsin

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