Effect of porous silicon substrate on structural, mechanical and optical properties of MOCVD and ALD ruthenium oxide nanolayers von Brytavskyi, Ievgen, Hušeková, Kristína, Myndrul, Valerii, Pavlenko, Mykola, Coy, Emerson, Zaleski, Karol, Gregušová, Dagmar, Yate, Luis, Smyntyna, Valentyn, Iatsunskyi, Igor

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Creation of Two‐Dimensional Electron Gas and Role of Surface Donors in III‐N Metal‐Oxide‐Semiconductor High‐Electron Mobility Transistors von Gucmann, Filip, Ťapajna, Milan, Pohorelec, Ondrej, Haščík, Štefan, Hušeková, Kristína, Kuzmík, Ján

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Si-Based Metal–Insulator–Semiconductor Structures with RuO2–(IrO2) Films for Photoelectrochemical Water Oxidation von Sahoo, Prangya P, Mikolášek, Miroslav, Hušeková, Kristína, Dobročka, Edmund, Šoltýs, Ján, Ondrejka, Peter, Kemény, Martin, Harmatha, Ladislav, Mičušík, Matej, Fröhlich, Karol

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Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes von Murakami, Katsuhisa, Rommel, Mathias, Hudec, Boris, Rosová, Alica, Hušeková, Kristína, Dobročka, Edmund, Rammula, Raul, Kasikov, Aarne, Han, Jeong Hwan, Lee, Woongkyu, Song, Seul Ji, Paskaleva, Albena, Bauer, Anton J, Frey, Lothar, Fröhlich, Karol, Aarik, Jaan, Hwang, Cheol Seong

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Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting von Chymo, Filip, Fröhlich, Karol, Kundrata, Ivan, Hušeková, Kristína, Harmatha, Ladislav, Racko, Juraj, Breza, Juraj, Mikolášek, Miroslav

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Development and characterisation of photoelectrochemical MIS structures with RuO2/TiO2 gate stacs for water oxidation von Mikolášek, Miroslav, Fröhlich, Karol, Hušeková, Kristína, Ondrejka, Peter, Chymo, Filip, Kemény, Martin, Hotovy, Ivan, Harmatha, Ladislav

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Structure and Thermal Stability of ε/κ-Ga 2 O 3 Films Deposited by Liquid-Injection MOCVD von Dobročka, Edmund, Gucmann, Filip, Hušeková, Kristína, Nádaždy, Peter, Hrubišák, Fedor, Egyenes, Fridrich, Rosová, Alica, Mikolášek, Miroslav, Ťapajna, Milan

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Structure and Thermal Stability of ε/κ-Ga[sub.2]O[sub.3] Films Deposited by Liquid-Injection MOCVD von Dobročka, Edmund, Gucmann, Filip, Hušeková, Kristína, Nádaždy, Peter, Hrubišák, Fedor, Egyenes, Fridrich, Rosová, Alica, Mikolášek, Miroslav, Ťapajna, Milan

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Phase‐Dependent Phonon Heat Transport in Nanoscale Gallium Oxide Thin Films von Xiao, Xinglin, Mao, Yali, Meng, Biwei, Ma, Guoliang, Hušeková, Kristína, Egyenes, Fridrich, Rosová, Alica, Dobročka, Edmund, Eliáš, Peter, Ťapajna, Milan, Gucmann, Filip, Yuan, Chao

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Development and characterisation of photoelectrochemical MIS structures with RuO 2 /TiO 2 gate stacs for water oxidation von Mikolášek, Miroslav, Fröhlich, Karol, Hušeková, Kristína, Ondrejka, Peter, Chymo, Filip, Kemény, Martin, Hotovy, Ivan, Harmatha, Ladislav

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Heteroepitaxial growth of Ga2O3 on 4H-SiC by liquid-injection MOCVD for improved thermal management of Ga2O3 power devices von Hrubišák, Fedor, Hušeková, Kristína, Zheng, Xiang, Rosová, Alica, Dobročka, Edmund, Ťapajna, Milan, Mičušík, Matej, Nádaždy, Peter, Egyenes, Fridrich, Keshtkar, Javad, Kováčová, Eva, Pomeroy, James W., Kuball, Martin, Gucmann, Filip

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Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors von Aarik, Lauri, Arroval, Tõnis, Rammula, Raul, Mändar, Hugo, Sammelselg, Väino, Hudec, Boris, Hušeková, Kristína, Fröhlich, Karol, Aarik, Jaan

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Structure and Thermal Stability of ε/κ-Ga2O3 Films Deposited by Liquid-Injection MOCVD von Dobročka, Edmund, Gucmann, Filip, Hušeková, Kristína, Nádaždy, Peter, Hrubišák, Fedor, Egyenes, Fridrich, Rosová, Alica, Mikolášek, Miroslav, Ťapajna, Milan

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Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor von Hudec, Boris, Hušeková, Kristína, Rosová, Alica, Šoltýs, Ján, Rammula, Raul, Kasikov, Aarne, Uustare, Teet, Mi ušík, Matej, Omastová, Mária, Aarik, Jaan, Fröhlich, Karol

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Si-Based Metal–Insulator–Semiconductor Structures with RuO 2 –(IrO 2 ) Films for Photoelectrochemical Water Oxidation von Sahoo, Prangya P., Mikolášek, Miroslav, Hušeková, Kristína, Dobročka, Edmund, Šoltýs, Ján, Ondrejka, Peter, Kemény, Martin, Harmatha, Ladislav, Mičušík, Matej, Fröhlich, Karol

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Thermal stability of rhombohedral α- and monoclinic β-Ga2O3 grown on sapphire by liquid-injection MOCVD von Gucmann, Filip, Nádaždy, Peter, Hušeková, Kristína, Dobročka, Edmund, Priesol, Juraj, Egyenes, Fridrich, Šatka, Alexander, Rosová, Alica, Ťapajna, Milan

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Raman spectroscopy of silicon with nanostructured surface von Kadlečíková, Magdaléna, Vančo, Ľubomír, Breza, Juraj, Mikolášek, Miroslav, Hušeková, Kristína, Fröhlich, Karol, Procel, Paul, Zeman, Miro, Isabella, Olindo

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Impact of plasma treatment on electrical properties of TiO 2 /RuO 2 based DRAM capacitor von Hudec, Boris, Hušeková, Kristína, Rosová, Alica, Šoltýs, Ján, Rammula, Raul, Kasikov, Aarne, Uustare, Teet, Mičušík, Matej, Omastová, Mária, Aarik, Jaan, Fröhlich, Karol

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Nanoscale Characterization of TiO 2 Films Grown by Atomic Layer Deposition on RuO 2 Electrodes von Murakami, Katsuhisa, Rommel, Mathias, Hudec, Boris, Rosová, Alica, Hušeková, Kristína, Dobročka, Edmund, Rammula, Raul, Kasikov, Aarne, Han, Jeong Hwan, Lee, Woongkyu, Song, Seul Ji, Paskaleva, Albena, Bauer, Anton J., Frey, Lothar, Fröhlich, Karol, Aarik, Jaan, Hwang, Cheol Seong

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ZrO 2 /InAlN/GaN Metal–Oxide–Semiconductor Heterostructure Field-Effect Transistors with InAlN Barrier of Different Compositions von Gregušová, Dagmar, Hušeková, Kristína, Stoklas, Roman, Blaho, Michal, Jurkovič, Michal, Carlin, Jean-Francois, Grandjean, Nicolas, Kordoš, Peter

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