The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water von Rudolph, M., Stanescu, D., Alvarez, J., Foy, E., Kleider, J.-P., Magnan, H., Minea, T., Herlin-Boime, N., Bouchet-Fabre, B., Hugon, M.-C.

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Improving the degree of crystallinity of magnetron-sputtered Ta3N5 thin films by augmenting the ion flux onto the substrate von Rudolph, M., Demeter, A., Foy, E., Tiron, V., Sirghi, L., Minea, T., Bouchet-Fabre, B., Hugon, M.-C.

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Oxygen incorporated during deposition determines the crystallinity of magnetron-sputtered Ta3N5 films von Rudolph, M., Vickridge, I., Foy, E., Alvarez, J., Kleider, J.-P., Stanescu, D., Magnan, H., Herlin-Boime, N., Bouchet-Fabre, B., Minea, T., Hugon, M.-C.

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Atomic layer deposition of tantalum nitride based thin films from cyclopentadienyl type precursor von Anacleto, A. Correia, Zauner, A., Cany-Canian, D., Gatineau, J., Hugon, M.-C.

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Interface study between nanostructured tantalum nitride films and carbon nanotubes grown by chemical vapour deposition von Bouchet-Fabre, B., Pinault, M., Foy, E., Hugon, M.C., Minéa, T., Mayne-L’Hermite, M.

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Study of a HPPMS discharge in Ar/O2 mixture: II. Plasma optical emission and deposited RuOx film properties von Benzeggouta, D, Hugon, M C, Bretagne, J

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Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growth von Jin, C., Delmas, M., Aubert, P., Alvarez, F., Minéa, T., Hugon, M.C., Bouchet-Fabre, B.

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Influence of the structure and composition of titanium nitride substrates on carbon nanotubes grown by chemical vapour deposition von Morales, M, Cucatti, S, Acuña, J J S, Zagonel, L F, Antonin, O, Hugon, M C, Marsot, N, Bouchet-Fabre, B, Minea, T, Alvarez, F

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Study of a HPPMS discharge in Ar/O2 mixture: I. Discharge characteristics with Ru cathode von Benzeggouta, D, Hugon, M C, Bretagne, J, Ganciu, M

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Investigation of BST thin films deposited by RF magnetron sputtering in pure Argon von Challali, F., Besland, M.P., Benzeggouta, D., Borderon, C., Hugon, M.C., Salimy, S., Saubat, J.C., Charpentier, A., Averty, D., Goullet, A., Landesman, J.P.

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Investigation of lanthanum and hafnium-based dielectric films by X-ray reflectivity, spectroscopic ellipsometry and X-ray photoelectron spectroscopy von Edon, V., Hugon, M.-C., Agius, B., Durand, O., Eypert, C., Cardinaud, C.

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Tantalum based coated substrates for controlling the diameter of carbon nanotubes von Bouchet-Fabre, B., Djomkam, A. Fadjie, Delmas, M., Jin, C., Antonin, O., Hugon, M.C., Mayne-L’Hermite, M.F., Alvarez, F., Minéa, T.

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TaSiN diffusion barriers deposited by reactive magnetron sputtering von Letendu, F., Hugon, M.C., Agius, B., Vickridge, I., Berthier, C., Lameille, J.M.

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New type of plasma reactor for thin film deposition: magnetron plasma process assisted by microwaves to ionise sputtered vapour von Boisse-Laporte, C., Leroy, O., de Poucques, L., Agius, B., Bretagne, J., Hugon, M.C., Teulé-Gay, L., Touzeau, M.

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Study of a HPPMS discharge in Ar/O 2 mixture: I. Discharge characteristics with Ru cathode von Benzeggouta, D, Hugon, M C, Bretagne, J, Ganciu, M

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Effects of sputter deposition parameters and post-deposition annealing on the electrical characteristics of LaAlO3 dielectric films on Si von EDON, V, HUGON, M. C, AGIUS, B, MIOTTI, L, RADTKE, C, TATSCH, F, GANEM, J. J, TRIMAILLE, I, BAUMVOL, I. J. R

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IPVD deposition of titanium based thin films von Imbert, J.C., de Poucques, L., Boisse-Laporte, C., Bretagne, J., Hugon, M.C., Teulé-Gay, L., Touzeau, M., Shtansky, D., Voldoire, O.

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Effects of post-deposition annealing in O2 on the electrical characteristics of LaAlO3 films on Si von Miotti, L., Bastos, K. P., Driemeier, C., Edon, V., Hugon, M. C., Agius, B., Baumvol, I. J. R.

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Electrical characteristics and interface structure of HfAlO∕SiON∕Si(001) stacks von Edon, V., Li, Z., Hugon, M.-C., Agius, B., Krug, C., Baumvol, I. J. R., Durand, O., Eypert, C.

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Structural and electrical properties of the interfacial layer in sputter deposited LaAlO3/Si thin films von EDON, V, HUGON, M. C, AGIUS, B, COHEN, C, CARDINAUD, C. H, EYPERT, C

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