Overview of atomic layer etching in the semiconductor industry von Kanarik, Keren J., Lill, Thorsten, Hudson, Eric A., Sriraman, Saravanapriyan, Tan, Samantha, Marks, Jeffrey, Vahedi, Vahid, Gottscho, Richard A.

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Etch selectivity during plasma-assisted etching of SiO2 and SiNx: Transitioning from reactive ion etching to atomic layer etching von Gasvoda, Ryan J., Zhang, Zhonghao, Wang, Scott, Hudson, Eric A., Agarwal, Sumit

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Selective Gas-Phase Functionalization of SiO2 and SiNx Surfaces with Hydrocarbons von Gasvoda, Ryan J., Xu, Wanxing, Zhang, Zhonghao, Wang, Scott, Hudson, Eric A., Agarwal, Sumit

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Fluorocarbon based atomic layer etching of Si3N4 and etching selectivity of SiO2 over Si3N4 von Li, Chen, Metzler, Dominik, Lai, Chiukin Steven, Hudson, Eric A., Oehrlein, Gottlieb S.

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Differential expression and responsiveness of chemokine receptors (CXCR1–3) by human microvascular endothelial cells and umbilical vein endothelial cells von Salcedo, Rosalba, Resau, James H., Halverson, Douglas, Hudson, Eric A., Dambach, Michael, Powell, Douglas, Wasserman, Ken, Oppenheim, Joost J.

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Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO2 von Gasvoda, Ryan J, van de Steeg, Alex W, Bhowmick, Ranadeep, Hudson, Eric A, Agarwal, Sumit

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Selective Gas-Phase Functionalization of SiO 2 and SiN x Surfaces with Hydrocarbons von Gasvoda, Ryan J, Xu, Wanxing, Zhang, Zhonghao, Wang, Scott, Hudson, Eric A, Agarwal, Sumit

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Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment von Nest, Dustin, Chung, Ting-Ying, Graves, David B., Engelmann, Sebastian, Bruce, Robert L., Weilnboeck, Florian, Oehrlein, Gottlieb S., Wang, Deyan, Andes, Cecily, Hudson, Eric A.

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Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces von Cagomoc, Charisse Marie D., Isobe, Michiro, Hudson, Eric A., Hamaguchi, Satoshi

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Predicting synergy in atomic layer etching von Kanarik, Keren J., Tan, Samantha, Yang, Wenbing, Kim, Taeseung, Lill, Thorsten, Kabansky, Alexander, Hudson, Eric A., Ohba, Tomihito, Nojiri, Kazuo, Yu, Jengyi, Wise, Rich, Berry, Ivan L., Pan, Yang, Marks, Jeffrey, Gottscho, Richard A.

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Investigation of thin oxide layer removal from Si substrates using an SiO2 atomic layer etching approach: the importance of the reactivity of the substrate von Metzler, Dominik, Li, Chen, Lai, C Steven, Hudson, Eric A, Oehrlein, Gottlieb S

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Gas Phase Organic Functionalization of SiO2 with Propanoyl Chloride von Gasvoda, Ryan J, Wang, Scott, Hausmann, Dennis M, Hudson, Eric A, Agarwal, Sumit

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Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group von Chung, Ting-Ying, Graves, David B., Weilnboeck, Florian, Bruce, Robert L., Oehrlein, Gottlieb S., Li, Mingqi, Hudson, Eric A.

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Profile simulation of high aspect ratio contact etch von Kim, Doosik, Hudson, Eric A., Cooperberg, David, Edelberg, Erik, Srinivasan, Mukund

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Surface prefunctionalization of SiO2 to modify the etch per cycle during plasma-assisted atomic layer etching von Gasvoda, Ryan J., Verstappen, Yuri G. P., Wang, Scott, Hudson, Eric A., Agarwal, Sumit

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Gas Phase Organic Functionalization of SiO 2 with Propanoyl Chloride von Gasvoda, Ryan J, Wang, Scott, Hausmann, Dennis M, Hudson, Eric A, Agarwal, Sumit

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Identification of a lysosomal pathway that modulates glucocorticoid signaling and the inflammatory response von He, Yuanzheng, Xu, Yong, Zhang, Chenghai, Gao, Xiang, Dykema, Karl J, Martin, Katie R, Ke, Jiyuan, Hudson, Eric A, Khoo, Sok Kean, Resau, James H, Alberts, Arthur S, MacKeigan, Jeffrey P, Furge, Kyle A, Xu, H Eric

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Investigation of thin oxide layer removal from Si substrates using an SiO 2 atomic layer etching approach: the importance of the reactivity of the substrate von Metzler, Dominik, Li, Chen, Lai, C Steven, Hudson, Eric A, Oehrlein, Gottlieb S

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Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO 2 von Gasvoda, Ryan J, van de Steeg, Alex W, Bhowmick, Ranadeep, Hudson, Eric A, Agarwal, Sumit

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Use of the ultraviolet absorption spectrum of CF2 to determine the spatially resolved absolute CF2 density, rotational temperature, and vibrational distribution in a plasma etching... von Bulcourt, Nicolas, Booth, Jean-Paul, Hudson, Eric A, Luque, Jorge, Mok, Daniel K W, Lee, Edmond P, Chau, Foo-Tim, Dyke, John M

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