Design of an atomic layer deposition system with in situ reflection high energy electron diffraction von Howzen, Alexandra J., Caspar, Justin, Oztekin, Alparslan, Strandwitz, Nicholas C.

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Surface pretreatment and deposition temperature dependence of MgO epitaxy on GaN by thermal atomic layer deposition von Goodrich, Justin C., Farinha, Thomas G., Ju, Ling, Howzen, Alexandra J., Kundu, Animesh, Ogidi-Ekoko, Onoriode N., Wierer, Jonathan J., Tansu, Nelson, Strandwitz, Nicholas C.

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Electrical properties of MgO/GaN metal-oxide-semiconductor structures von Ogidi-Ekoko, Onoriode N., Goodrich, Justin C., Howzen, Alexandra J., Peart, Matthew R., Strandwitz, Nicholas C., Wierer, Jonathan J., Tansu, Nelson

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