Characterisation of aluminium oxynitride gas barrier films von Erlat, A.G, Henry, B.M, Ingram, J.J, Mountain, D.B, McGuigan, A, Howson, R.P, Grovenor, C.R.M, Briggs, G.A.D, Tsukahara, Y

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Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films von Bhagwat, S., Howson, R.P.

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A microstructural study of transparent metal oxide gas barrier films von Henry, B.M, Dinelli, F, Zhao, K.-Y, Grovenor, C.R.M, Kolosov, O.V, Briggs, G.A.D, Roberts, A.P, Kumar, R.S, Howson, R.P

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Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates von Danson, N., Safi, I., Hall, G.W., Howson, R.P.

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Reactive filtered arc evaporation von Mustapha, N.M, Howson, R.P

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The properties of reactively-sputtered, stoichiometry-controlled and optimum-conductivity transparent indium oxide films as a function of their titanium, aluminium and zinc content... von Safi, I., Howson, R.P.

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Optical TiN films by filtered arc evaporation von Mustapha, N., Howson, R.P.

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Synthesis of sputtered thin films in low energy ion beams von Howson, R.P.

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Indium oxide film formation by O 2 cluster ion-assisted deposition von Qin, Wei, Philip Howson, Ronald, Akizuki, Makoto, Matsuo, Jiro, Takaoka, Gikan, Yamada, Isao

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The reactive sputtering of oxides and nitrides von Howson, R. P.

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Dielectric relaxation in hard, plasma-polymerized C:H films von Stundzia, V, Biederman, H, Slavínská, D, Nedbal, J, Hlídek, P, Poskus, A, Mackus, P K, Howson, R P

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The properties of reactively sputtered, stoichiometry-controlled and optimum-conductivity transparent zinc/aluminium oxide films as a function of their aluminium content von Safi, I., Danson, N., Howson, R.P.

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TiN films prepared by unbalanced planar magnetron sputtering under control of photoemission of Ti von Tominaga, Kikuo, Inoue, Shozo, Howson, Ronald P., Kusaka, Kazuya, Hanabusa, Takao

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Structure and composition of (Ti, Al)N films prepared by r.f. planar magnetron sputtering using a composite target von Inoue, Shozo, Uchida, Hitoshi, Hioki, Atsushi, Koterazawa, Keiji, Howson, Ronald P.

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Comparison of unbalanced magnetron sputtering and filtered arc evaporation for the preparation of films onto insulating substrates von Mustapha, N, Howson, RP

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Composite metal/C:H films prepared in an unbalanced magnetron von Biederman, H., Howson, R.P., Slavínská, D., Stundžia, V., Zemek, J.

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Preparation of compositionally gradient Ti-TiN films by r.f. reactive sputtering von Inoue, Shozo, Ucihda, Hitoshi, Takeshita, Kazuyoshi, Koterazawa, Keiji, Howson, Ronald P.

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Improved control techniques for the reactive magnetron sputtering of silicon to produce silicon oxide and the implications for selected film properties von Danson, Nigel, Hall, Gareth W, Howson, Ronald P

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Sputtering of indium-tin oxide von Howson, R.P., Safi, I., Hall, G.W., Danson, N.

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Reactive magnetron sputtering of silicon to produce silicon oxide von Howson, R.P., Danson, N., Hall, G.W.

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